Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | PKM | P14618 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28266216 | 1.00 | ALDH1A1 (0.43) | ALDH1A1KDM4EMEN1KMT2ASMN1; SMN2 | |
| SCHEMBL28544343 | 0.89 | ALDH1A1 (0.45) | ALDH1A1KDM4EMEN1KMT2ASMN1; SMN2 | |
| SCHEMBL28287527 | 0.79 | MEN1 (0.56) | ALDH1A1KDM4EMEN1KMT2ASMN1; SMN2 | |
| SCHEMBL30438767 | 0.79 | MEN1 (0.56) | ALDH1A1KDM4EMEN1KMT2ASMN1; SMN2 | |
| SCHEMBL9906959 | 0.72 | ALDH1A1 (0.44) | ALDH1A1KDM4EMEN1KMT2ATSHR | |
| SCHEMBL13900323 | 0.69 | ALDH1A1 (0.54) | ALDH1A1KDM4EKMT2ATSHR | |
| SCHEMBL12119693 | 0.69 | ALDH1A1 (0.50) | ALDH1A1KDM4EMEN1KMT2ASMN1; SMN2 | |
| SCHEMBL3187749 | 0.68 | ALDH1A1 (0.53) | ALDH1A1KDM4EMEN1KMT2ASMN1; SMN2 | |
| SCHEMBL29625376 | 0.66 | MEN1 (0.63) | ALDH1A1MEN1KMT2ASMN1; SMN2TSHR | |
| SCHEMBL3196336 | 0.66 | MEN1 (0.63) | ALDH1A1MEN1KMT2ASMN1; SMN2TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113820920-B | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2023-07-04 | — | — | CN | disclosed |