Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.56 |
| ▸ | TSHR | P16473 | 1/20 | 0.56 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.56 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.55 |
| ▸ | MAPT | P10636 | 2/20 | 0.49 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.49 |
| ▸ | USP2 | O75604 | 1/20 | 0.47 |
| ▸ | GAA | P10253 | 2/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28287527 | 1.00 | MEN1 (0.56) | MEN1KMT2ATSHRESR2SMN1; SMN2 | |
| SCHEMBL3196336 | 0.87 | MEN1 (0.63) | MEN1KMT2ATSHRESR2SMN1; SMN2 | |
| SCHEMBL29625376 | 0.87 | MEN1 (0.63) | MEN1KMT2ATSHRESR2SMN1; SMN2 | |
| SCHEMBL28266216 | 0.79 | ALDH1A1 (0.43) | MEN1KMT2ATSHRESR2SMN1; SMN2 | |
| SCHEMBL30438357 | 0.79 | ALDH1A1 (0.43) | MEN1KMT2ATSHRESR2SMN1; SMN2 | |
| SCHEMBL5922774 | 0.77 | MEN1 (0.52) | MEN1KMT2ATSHRESR2SMN1; SMN2 | |
| SCHEMBL3187616 | 0.77 | MEN1 (0.52) | MEN1KMT2ATSHRESR2SMN1; SMN2 | |
| SCHEMBL5922893 | 0.76 | TSHR (0.62) | MEN1KMT2ATSHRESR2SMN1; SMN2 | |
| SCHEMBL3187767 | 0.76 | TSHR (0.62) | MEN1KMT2ATSHRESR2SMN1; SMN2 | |
| SCHEMBL13483337 | 0.76 | TSHR (0.62) | MEN1KMT2ATSHRESR2SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113820920-B | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2023-07-04 | — | — | CN | disclosed |