SCHEMBL304562

SCHEMBL304562

COc1ccc(-c2c3ccccc3nc3ccccc23)cc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.61
ALDH1A1 P00352 4/20 0.61
LMNA P02545 3/20 0.61
NPSR1 Q6W5P4 1/20 0.61
TDP1 Q9NUW8 1/20 0.61
L3MBTL1 Q9Y468 1/20 0.61
MAPT P10636 2/20 0.59
ACACA Q13085 1/20 0.59
HPGD P15428 1/20 0.59
HTT P42858 1/20 0.59
ADORA2A P29274 1/20 0.59
POLB P06746 3/20 0.58
KDM1A O60341 1/20 0.58
RAD52 P43351 1/20 0.58
GFER P55789 1/20 0.58
KMT2A Q03164 1/20 0.58
CYP1A2 P05177 2/20 0.58
CYP1A1 P04798 1/20 0.58
CYP1B1 Q16678 1/20 0.58
NPC1 O15118 3/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL32679263 0.86 ESR1 (0.63) KDM4EALDH1A1LMNANPSR1TDP1
SCHEMBL29043030 0.86 ESR1 (0.63) KDM4EALDH1A1LMNANPSR1TDP1
SCHEMBL28364890 0.86 ESR1 (0.63) KDM4EALDH1A1LMNANPSR1TDP1
SCHEMBL21235656 0.84 ACHE (0.62) KDM4EALDH1A1LMNANPSR1TDP1
SCHEMBL30633883 0.84 ACHE (0.62) KDM4EALDH1A1LMNANPSR1TDP1
SCHEMBL29458789 0.84 ACHE (0.61) KDM4EALDH1A1LMNAMAPTACACA
SCHEMBL1470672 0.84 ACHE (0.61) KDM4EALDH1A1LMNAMAPTACACA
SCHEMBL8086014 0.84 ALDH1A1 (0.55) KDM4EALDH1A1LMNANPSR1TDP1
SCHEMBL29499037 0.83 ENPP1 (0.48) KDM4EALDH1A1LMNANPSR1TDP1
SCHEMBL28160154 0.82 ALDH1A1 (0.67) KDM4EALDH1A1LMNANPSR1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 384 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110357989-B Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition 常州强力电子新材料股份有限公司 2022-04-22 CN claimed
CN-108241259-B Resist composition with good hole masking function and capable of directly depicting, exposing and imaging 杭州福斯特电子材料有限公司 2021-08-10 CN claimed
CN-110357989-A Tertiary amine photosensitizer, preparation method, comprising its photosensitive polymer combination and photosensitive polymer combination application 常州强力电子新材料股份有限公司 2019-10-22 CN claimed
EP-0626431-B1 PHOTOCURABLE CONDUCTIVE COATING COMPOSITION SEKISUI CHEMICAL CO LTD (JP) 2000-01-26 EP claimed
US-5429846-A Antimony oxide-containing tin oxide powder, (meth) acrylate compound, acetal resin, photopolymerization initiator and organic solvent SEKISUI CHEMICAL CO., LTD. (JP) 1995-07-04 US claimed
EP-0626431-A1 PHOTOCURABLE CONDUCTIVE COATING COMPOSITION SEKISUI CHEMICAL CO., LTD. (JP) 1994-11-30 EP claimed
US-5346805-A Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask FUJI PHOTO FILM CO., LTD. (JP) 1994-09-13 US claimed
US-4780393-A POLYMERIC BINDER, TERMINAL ETHYLENIC COMPOUND, PHOTOINITIATOR, LEVCO BASE OF TRIARYLMETHANE DYE AND PHOTOC ROMIC SPIRO-INDOLINO-BENZOPYRAN COMPOUND HOECHST AKTIENGESELLSCHAFT (DE) 1988-10-25 US claimed
US-4587200-A Photopolymerizable composition comprising an acridine and a heterocyclic thiol compound as a photopolymerization initiator and a photographic process using said photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1986-05-06 US claimed
US-4485166-A CROSSLINKABLE BLEND OF UNSATURATED COMPOUND, BINDER, ACTIVATOR, AND EPOXIDE HOECHST AKTIENGESELLSCHAFT (DE) 1984-11-27 US claimed
US-4387139-A Elastomeric, ethylenically unsaturated polyurethanes and radiation polymerizable mixtures containing such polyurethanes KALLE, NIEDERLASSUNG DER HOECHST AG (DE) 1983-06-07 US claimed
CN-116615332-B Optically anisotropic laminate and optical element MITSUBISHI CHEMICAL CORP. (JP) 2026-05-26 CN disclosed
US-12353130-B2 Photosensitive resin composition and photosensitive resin multilayer body ASAHI KASEI KABUSHIKI KAISHA (JP) 2025-07-08 US disclosed
CN-119998729-A Colorant-containing liquid, colored resin composition, color filter, image display device, and method for producing colored resin composition 三菱化学株式会社 2025-05-13 CN disclosed
CN-119948372-A Optically anisotropic laminate and optical element 三菱化学株式会社 2025-05-06 CN disclosed
US-4175964-A SUCCESSIVE SURFACE TREATMENT WITH AQUEOUS SOLUTIONS OF PHOSPHORIC ACID AND SILICIC ACID OR ITS SALTS FUJI PHOTO FILM CO., LTD. (JP) 1979-11-27 US disclosed
EP-0003804-A1 Photopolymerizable composition containing a monoazo dye HOECHST AKTIENGESELLSCHAFT (DE) 1979-09-05 EP disclosed
US-4088498-A Photopolymerizable copying composition HOECHST AKTIENGESELLSCHAFT (DT) 1978-05-09 US disclosed
US-4019972-A Photopolymerizable copying compositions containing biuret-based polyfunctional monomers HOECHST AKTIENGESELLSCHAFT (DT) 1977-04-26 US disclosed
US-3930865-A PHOTOINITIATOR, TERPOLYMER CONTAINING UNSATURATED CARBOXYLIC ACID, ALKYL METHACRYLATE HOECHST AKTIENGESELLSCHAFT (DT) 1976-01-06 US disclosed