⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1231375 | 0.89 | — | — | |
| SCHEMBL11706241 | 0.83 | — | — | |
| SCHEMBL65415 | 0.81 | THRB (0.36) | — | |
| SCHEMBL3151031 | 0.79 | ALDH1A1 (0.32) | — | |
| SCHEMBL305971 | 0.78 | — | — | |
| SCHEMBL66393 | 0.77 | — | — | |
| SCHEMBL306060 | 0.77 | — | — | |
| SCHEMBL4758783 | 0.73 | THRB (0.31) | — | |
| SCHEMBL6295074 | 0.72 | THRB (0.36) | — | |
| SCHEMBL7515029 | 0.72 | THRB (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 89 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240230952-A1 | LAMINATE AND METHOD FOR MANUFACTURING LAMINATE | FUJIFILM CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| US-20240059803-A1 | PHOTOSENSITIVE RESIN MULTILAYER BODY AND METHOD FOR PRODUCING SAME | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-02-22 | — | — | US | disclosed |
| US-20230340330-A1 | COMPOSITION FOR COLOR CONVERSION FILM, COLOR CONVERSION FILM, METHOD FOR MANUFACTURING COLOR CONVERSION FILM, BACKLIGHT UNIT, AND LIQUID CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2023-10-26 | — | — | US | disclosed |
| US-20230324739-A1 | COMPOSITION FOR COLOR CONVERSION FILM, COLOR CONVERSION FILM, METHOD FOR MANUFACTURING COLOR CONVERSION FILM, BACKLIGHT UNIT, AND LIQUID CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2023-10-12 | — | — | US | disclosed |
| WO-2023042737-A1 | LAMINATE AND METHOD FOR MANUFACTURING LAMINATE | 富士フイルム株式会社 | 2023-03-23 | — | — | WO | disclosed |
| US-10345704-B2 | Photosensitive element | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2019-07-09 | — | — | US | disclosed |
| EP-2357521-B1 | Photosensitive conductive film, method of forming a conductive film substrate and method of forming a conductive pattern substrate | HITACHI CHEMICAL CO LTD (JP) | 2016-11-02 | — | — | EP | disclosed |
| US-9439291-B2 | Photosensitive element, method for forming resist pattern, and method for producing printed circuit board | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2016-09-06 | — | — | US | disclosed |
| US-9161442-B2 | Photosensitive conductive film, method for forming conductive film, method for forming conductive pattern, and conductive film substrate | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2015-10-13 | — | — | US | disclosed |
| US-9119310-B2 | — | — | 2015-08-25 | — | — | US | disclosed |
| US-20040086801-A1 | Method for manufacturing printeed wiring board and photosensitive resin composition used to be used for it | HITACHI CHEMICAL CO., LTD (JP) | 2004-05-06 | — | — | US | disclosed |
| US-20040063025-A1 | Resist pattern, process for producing same, and utilization thereof | HITACHI CHEMICAL CO., LTD. (JP) | 2004-04-01 | — | — | US | disclosed |
| US-20040038149-A1 | Photosensitive resin composition, photosensitive element comprising the same, method for producing resist pattern, and method for producing printed wiring board | HITACHI CHEMICAL CO., LTD. (JP) | 2004-02-26 | — | — | US | disclosed |
| US-20040018446-A1 | Photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board | HITACHI CHEMICAL CO., LTD. (JP) | 2004-01-29 | — | — | US | disclosed |
| EP-1282010-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT COMPRISING THE SAME, METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2003-02-05 | — | — | EP | disclosed |
| EP-1205802-A1 | PHOTOSENSITIVE ELEMENT, PHOTOSENSITIVE ELEMENT ROLL, PROCESS FOR PRODUCING RESIST PATTERN WITH THE SAME, RESIST PATTERN, SUBSTRATE WITH OVERLYING RESIST PATTERN, PROCESS FOR PRODUCING WIRING PATTERN, AND WIRING PATTERN | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2002-05-15 | — | — | EP | disclosed |
| EP-0769038-B1 | SYNTHETIC MORTAR RESIN COMPOSITIONS | CRAY VALLEY SA (FR) | 1998-03-04 | — | — | EP | disclosed |
| EP-0769038-A1 | SYNTHETIC MORTAR RESIN COMPOSITIONS | CRAY VALLEY SA (FR) | 1997-04-23 | — | — | EP | disclosed |
| WO-1996001876-A1 | SYNTHETIC MORTAR RESIN COMPOSITIONS | CRAY VALLEY S.A. (FR) | 1996-01-25 | — | — | WO | disclosed |
| US-4055542-A | PEROXIDE | THREE BOND CO., LTD. (JA) | 1977-10-25 | — | — | US | disclosed |