SCHEMBL3048684

SCHEMBL3048684

CCOc1[c]ccc(O)c1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 1/20 0.38
NQO1 P15559 1/20 0.34
CALM1 P0DP23 1/20 0.34
CA12 O43570 2/20 0.33
CA1 P00915 2/20 0.33
CA2 P00918 2/20 0.33
CA7 P43166 2/20 0.33
CA9 Q16790 2/20 0.33
CA14 Q9ULX7 2/20 0.33
ALDH1A1 P00352 4/20 0.33
MAPT P10636 3/20 0.32
MAPK1 P28482 1/20 0.32
GAA P10253 3/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
NLRP3 Q96P20 1/20 0.31
HSD17B10 Q99714 2/20 0.31
KDM4E B2RXH2 1/20 0.31
GLA P06280 1/20 0.31
HPGD P15428 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL128388 0.78 NQO1 (0.46) LTA4HNQO1CA12CA1CA7
SCHEMBL11513183 0.78 NQO1 (0.36) NQO1ALDH1A1MAPTMAPK1MEN1
SCHEMBL197450 0.77
SCHEMBL36416 0.76 CA12 (0.33) CA12CA2CA9CA14ALDH1A1
SCHEMBL15352630 0.76 NQO1 (0.34) NQO1
SCHEMBL7690729 0.76 NQO1 (0.34) NQO1
SCHEMBL157423 0.76 TSHR (0.37) NQO1ALDH1A1MAPTGAAMEN1
SCHEMBL160927 0.76 NQO1 (0.34) NQO1TUBB1
SCHEMBL6602231 0.76 TP53 (0.46) NQO1ALDH1A1MAPTMAPK1GAA
SCHEMBL7774207 0.76 HPGD (0.37) NQO1CA12CA9ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7811637-B2 Silicon-containing polymer, process for producing the same, heat-resistant resin composition, and heat-resistant film TOAGOSEI CO., LTD. (JP) 2010-10-12 US claimed
US-8329815-B2 Silicone-containing polymer and a heat-resistant resin composition comprising the silicon-containing polymer TOAGOSEI CO., LTD. (JP) 2012-12-11 US disclosed
US-7811637-B2 Silicon-containing polymer, process for producing the same, heat-resistant resin composition, and heat-resistant film TOAGOSEI CO., LTD. (JP) 2010-10-12 US disclosed
EP-2159249-A1 Silicon-containing polymer and method for manufacturing the same, heat-resistant resin composition, and heat-resistant film TOAGOSEI CO., LTD. (JP) 2010-03-03 EP disclosed
US-20100029841-A1 SILICONE-CONTAINING POLYMER AND A HEAT-RESISTANT RESIN COMPOSITION COMPRISING THE SILICON-CONTAINING POLYMER TOAGOSEI CO., LTD. (JP) 2010-02-04 US disclosed
US-20070134424-A1 excellent in alkali solubility despite high molecular weight; resists, aerospace, semiconductors; polycondensing alkoxy- or hydroxyphenylalkyltriethoxysilane and tetraethoxysilane with hexamethyldisiloxane to endcap with trimethylsilanol and no toxic gas generated; polysiloxane and polysilicate copolymer TOAGOSEI CO., LTD. (JP) 2007-06-14 US disclosed
EP-1650250-A1 SILICON-CONTAINING POLYMER, PROCESS FOR RPODUCING THE SAME, HEAT-RESISTANT RESIN COMPOSITION, AND HEAT-RESISTANT FILM TOAGOSEI CO., LTD. (JP) 2006-04-26 EP disclosed
EP-1613626-A1 CYCLIC BENZIMIDAZOLES ALTANA Pharma AG (DE) 2006-01-11 EP disclosed
WO-2004087701-A1 CYCLIC BENZIMIDAZOLES ALTANA PHARMA AG (DE) 2004-10-14 WO disclosed
EP-0413162-A2 Novel cyclic acetals GIVAUDAN-ROURE (INTERNATIONAL) S.A. (CH) 1991-02-20 EP disclosed