SCHEMBL3048952

SCHEMBL3048952

CC1(COc2ccccc2)COC1

nearest known ligand 0.44

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ACACB O00763 1/20 0.44
DHFR P00374 1/20 0.43
DCPS Q96C86 1/20 0.43
FFAR1 O14842 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
KCNA3 P22001 1/20 0.40
SLC5A1 P13866 1/20 0.39
SLC5A2 P31639 1/20 0.39
HTR1A P08908 1/20 0.38
LTA4H P09960 1/20 0.38
FLT3 P36888 3/20 0.38
PDE2A O00408 1/20 0.37
PDE10A Q9Y233 1/20 0.37
LMNA P02545 1/20 0.37
HTR1D P28221 1/20 0.37
HTR1B P28222 1/20 0.37
TAAR1 Q96RJ0 1/20 0.36
ALDH1A1 P00352 1/20 0.36
RECQL P46063 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9935890 0.90 ACACB (0.50) ACACBDHFRDCPSFFAR1SLC5A1
SCHEMBL9936128 0.87 DHFR (0.46) ACACBDHFRDCPSFFAR1SLC5A1
SCHEMBL17899755 0.83 KCNA3 (0.50) KCNA3HTR1ALTA4HHTR1DHTR1B
SCHEMBL13724692 0.83 ACACB (0.46) ACACBDHFRDCPSFFAR1SLC5A1
SCHEMBL29135525 0.82 DHFR (0.55) ACACBDHFRDCPSFFAR1SLC5A1
SCHEMBL24780612 0.82 KCNA3 (0.44) ACACBTDP1KCNA3LTA4HLMNA
SCHEMBL6304645 0.81 TDP1 (0.47) ACACBDHFRDCPSTDP1SLC5A1
SCHEMBL17610764 0.81 ACACB (0.42) ACACBDHFRDCPSFFAR1SLC5A1
SCHEMBL24609941 0.81 ACACB (0.45) ACACBDHFRDCPSFFAR1SLC5A1
SCHEMBL15577850 0.81 ACACB (0.45) ACACBDHFRDCPSFFAR1SLC5A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 106 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7807230-B2 Curcumin and curcuminoid compounds, and use thereof as photosensitizers of onium salts RENSSELAER POLYTECHNIC INSTITUTE (US) 2010-10-05 US claimed
US-7592376-B2 Photopolymerizable epoxide and oxetane compositions RENSSELAER POLYTECHNIC INSTITUTE (US) 2009-09-22 US claimed
US-20080260960-A1 Curcumin and Curcuminoid Compounds, and Use Thereof as Photosensitizers of Onium Salts RENSSELAER POLYTECHNIC INSTITUTE (US) 2008-10-23 US claimed
WO-2006138637-A1 CURCUMIN AND CURCUMINOID COMPOUNDS, AND USE THEREOF AS PHOTOSENSITIZERS OF ONIUM SALTS RENSSELAER POLYTECHNIC INSTITUTE (US) 2006-12-28 WO claimed
US-20060041032-A1 Photopolymerizable epoxide and oxetane compositions CRIVELLO JAMES V 2006-02-23 US claimed
US-11958971-B2 Photocurable composition, method for producing concave-convex structure, method for forming fine concave-convex pattern, and concave-convex structure MITSUI CHEMICALS, INC. (JP) 2024-04-16 US disclosed
CN-110741463-B Method for producing substrate with fine concave-convex pattern, resin composition, and laminate 三井化学株式会社 2024-02-20 CN disclosed
CN-110709774-B Underlayer film forming material, resist underlayer film, method for producing resist underlayer film, and laminate 三井化学株式会社 2023-12-08 CN disclosed
CN-113574086-B Photocurable composition, method for producing uneven structure, method for forming fine uneven pattern, and uneven structure 三井化学株式会社 2023-11-07 CN disclosed
US-11597910-B2 Medical instrument, cell culture method, fluorine-containing cyclic olefin polymer and fluorine-containing cyclic olefin polymer composition for it, and cultured cells MITSUI CHEMICALS, INC. (JP) 2023-03-07 US disclosed
US-11474429-B2 Method of producing substrate with fine uneven pattern, resin composition, and laminate MITSUI CHEMICALS, INC. (JP) 2022-10-18 US disclosed
US-20220216415-A1 ORGANIC ELECTRONICS MATERIAL AND METHOD FOR PREPARING CHARGE-TRANSPORTING POLYMER SHOWA DENKO MATERIALS CO., LTD. (JP) 2022-07-07 US disclosed
EP-1199327-A2 Water-absorbing agent and process for producing the same Nippon Shokubai Co., Ltd. (JP) 2002-04-24 EP disclosed
EP-0000722-B1 PROCESS FOR THE PREPARATION OF POLYURETHANES CONTAINING ARYLSULFONIC ACID ALKYL ESTER GROUPS BAYER AG (DE) 1982-09-29 EP disclosed
US-4237250-A Polyurethanes containing aryl sulfonic acid alkyl ester groups BAYER AKTIENGESELLSCHAFT (DE) 1980-12-02 US disclosed
US-4211850-A Polyhydroxy compounds containing urethane aryl sulfonic acid hydroxyalkyl ester groups BAYER AKTIENGESELLSCHAFT (DE) 1980-07-08 US disclosed
US-4201852-A Polyurethanes based on modified polyisocyanates containing sulphonic acid ester groups and process for the production thereof BAYER AKTIENGESELLSCHAFT (DE) 1980-05-06 US disclosed
US-4189562-A Polyhydroxy compounds containing urethane aryl sulfonic acid hydroxyalkyl ester groups BAYER AKTIENGESELLSCHAFT (DE) 1980-02-19 US disclosed
EP-0000722-A1 Process for the preparation of polyurethanes containing arylsulfonic acid alkyl ester groups BAYER AG (DE) 1979-02-21 EP disclosed
EP-0000723-A1 Polyhydroxy compounds containing urethane-aryl-sulfonic acid-hydroxyalkyl ester groups, process for their preparation and their use as reaction components for the preparation of polyurethane resins BAYER AG (DE) 1979-02-21 EP disclosed