Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DHFR | P00374 | 1/20 | 0.46 |
| ▸ | DCPS | Q96C86 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | TP53 | P04637 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.42 |
| ▸ | PDE2A | O00408 | 1/20 | 0.41 |
| ▸ | PDE10A | Q9Y233 | 1/20 | 0.41 |
| ▸ | FLT3 | P36888 | 4/20 | 0.41 |
| ▸ | ACACB | O00763 | 1/20 | 0.40 |
| ▸ | IRAK1 | P51617 | 2/20 | 0.40 |
| ▸ | IRAK4 | Q9NWZ3 | 2/20 | 0.40 |
| ▸ | FFAR1 | O14842 | 4/20 | 0.39 |
| ▸ | BACE1 | P56817 | 2/20 | 0.39 |
| ▸ | GAK | O14976 | 1/20 | 0.39 |
| ▸ | RIPK2 | O43353 | 1/20 | 0.39 |
| ▸ | ULK1 | O75385 | 1/20 | 0.39 |
| ▸ | STK10 | O94804 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12877672 | 0.92 | DHFR (0.41) | DHFRDCPSALDH1A1TP53CYP3A4 | |
| SCHEMBL13726105 | 0.90 | ACHE (0.43) | DHFRDCPSALDH1A1TSHRPDE2A | |
| SCHEMBL3048952 | 0.87 | ACACB (0.44) | DHFRDCPSALDH1A1PDE2APDE10A | |
| SCHEMBL9935890 | 0.84 | ACACB (0.50) | DHFRDCPSPDE2APDE10AFLT3 | |
| SCHEMBL7187755 | 0.83 | AGXT (0.47) | DHFRDCPSSMN1; SMN2PDE2APDE10A | |
| SCHEMBL5706342 | 0.82 | ALDH1A1 (0.41) | ALDH1A1TP53CYP3A4TSHRSMN1; SMN2 | |
| SCHEMBL36036 | 0.79 | TSHR (0.45) | ALDH1A1TP53CYP3A4TSHRSMN1; SMN2 | |
| SCHEMBL14814333 | 0.78 | DHFR (0.39) | DHFRDCPSPDE2APDE10AFLT3 | |
| SCHEMBL18003789 | 0.78 | ACACB (0.38) | DHFRDCPSPDE2APDE10AFLT3 | |
| SCHEMBL18482078 | 0.78 | ACACB (0.38) | DHFRDCPSSMN1; SMN2PDE2APDE10A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11958971-B2 | Photocurable composition, method for producing concave-convex structure, method for forming fine concave-convex pattern, and concave-convex structure | MITSUI CHEMICALS, INC. (JP) | 2024-04-16 | — | — | US | disclosed |
| CN-110741463-B | Method for producing substrate with fine concave-convex pattern, resin composition, and laminate | 三井化学株式会社 | 2024-02-20 | — | — | CN | disclosed |
| US-11886119-B2 | Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2024-01-30 | — | — | US | disclosed |
| CN-110709774-B | Underlayer film forming material, resist underlayer film, method for producing resist underlayer film, and laminate | 三井化学株式会社 | 2023-12-08 | — | — | CN | disclosed |
| CN-113574086-B | Photocurable composition, method for producing uneven structure, method for forming fine uneven pattern, and uneven structure | 三井化学株式会社 | 2023-11-07 | — | — | CN | disclosed |
| US-20230185195-A1 | MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE | MITSUI CHEMICALS, INC. (JP) | 2023-06-15 | — | — | US | disclosed |
| US-11599025-B2 | Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate | MITSUI CHEMICALS, INC. (JP) | 2023-03-07 | — | — | US | disclosed |
| US-11597910-B2 | Medical instrument, cell culture method, fluorine-containing cyclic olefin polymer and fluorine-containing cyclic olefin polymer composition for it, and cultured cells | MITSUI CHEMICALS, INC. (JP) | 2023-03-07 | — | — | US | disclosed |
| US-11474429-B2 | Method of producing substrate with fine uneven pattern, resin composition, and laminate | MITSUI CHEMICALS, INC. (JP) | 2022-10-18 | — | — | US | disclosed |
| EP-3998298-A1 | PHOTOCURABLE COMPOSITION, PRODUCTION METHOD FOR UNEVEN STRUCTURAL BODY, METHOD FOR FORMING MINUTE UNEVEN PATTERN, AND UNEVEN STRUCTURAL BODY | Mitsui Chemicals, Inc. (JP) | 2022-05-18 | — | — | EP | disclosed |
| US-20140264165-A1 | OXETANE-CONTAINING COMPOUNDS AND COMPOSITIONS THEREOF | HENKEL CORPORATION (US) | 2014-09-18 | — | — | US | disclosed |
| US-20140264165-A1 | OXETANE-CONTAINING COMPOUNDS AND COMPOSITIONS THEREOF | HENKEL CORPORATION (US) | 2014-09-18 | — | — | US | disclosed |
| US-20140209951-A1 | OXETANE-CONTAINING COMPOUNDS AND COMPOSITIONS THEREOF | Henkel IP & Holding GmbH (DE) | 2014-07-31 | — | — | US | disclosed |
| US-20140209951-A1 | OXETANE-CONTAINING COMPOUNDS AND COMPOSITIONS THEREOF | Henkel IP & Holding GmbH (DE) | 2014-07-31 | — | — | US | disclosed |
| US-20140021648-A1 | IMPRINT PRODUCT AND METHOD FOR PRODUCING THE SAME | MITSUI CHEMICALS, INC. (JP) | 2014-01-23 | — | — | US | disclosed |
| WO-2013049154-A2 | OXETANE-CONTAINING COMPOUNDS AND COMPOSITIONS THEREOF | HENKEL AG & CO. KGAA (DE) | 2013-04-04 | — | — | WO | disclosed |
| US-20120156448-A1 | FLUORINE-CONTAINING CYCLIC OLEFIN POLYMER COMPOSITION, IMPRINT PRODUCT OBTAINED USING THE COMPOSITION, AND METHOD FOR PRODUCING THE SAME | MITSUI CHEMICALS INC (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20110301313-A1 | IMPRINT PRODUCT AND METHOD FOR PRODUCING THE SAME | MITSUI CHEMICALS, INC. (JP) | 2011-12-08 | — | — | US | disclosed |
| EP-1866360-B1 | RADIATION-OR THERMALLY-CURABLE OXETANE BARRIER SEALANTS | HENKEL AG & CO KGAA (DE) | 2011-05-25 | — | — | EP | disclosed |
| EP-1992654-A1 | Radiation- or thermally-curable oxetane barrier sealants | National Starch and Chemical Investment Holding Corporation (US) | 2008-11-19 | — | — | EP | disclosed |