SCHEMBL30504001

SCHEMBL30504001

CCOc1cc(Oc2ccccc2)c(OCC)c2ccccc12

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LTA4H P09960 2/20 0.49
▸ SLC2A1 P11166 2/20 0.41
▸ NTRK1 P04629 1/20 0.40
▸ NTRK3 Q16288 1/20 0.40
▸ NTRK2 Q16620 1/20 0.40
▸ ADORA2A P29274 1/20 0.40
▸ ADORA1 P30542 1/20 0.40
▸ KMT2A Q03164 2/20 0.40
▸ KDM4E B2RXH2 1/20 0.40
▸ GLA P06280 1/20 0.40
▸ MAPT P10636 1/20 0.40
▸ MEN1 O00255 1/20 0.39
▸ CYP1A2 P05177 1/20 0.39
▸ CYP2C9 P11712 1/20 0.39
▸ CYP2C19 P33261 1/20 0.39
▸ SLC6A2 P23975 1/20 0.38
▸ SLC6A4 P31645 1/20 0.38
▸ SLC6A3 Q01959 1/20 0.38
▸ TSHR P16473 1/20 0.38
▸ POLB P06746 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19612421 1.00 LTA4H (0.49) LTA4HSLC2A1NTRK1NTRK3NTRK2
SCHEMBL29025187 0.86 SLC2A1 (0.50) SLC2A1ADORA2AADORA1KDM4EGLA
SCHEMBL19612348 0.84 LTA4H (0.46) LTA4HNTRK1NTRK3NTRK2KMT2A
SCHEMBL19612202 0.83 LTA4H (0.54) LTA4HSLC2A1CYP1A2CYP2C9CYP2C19
SCHEMBL17912871 0.83 LTA4H (0.47) LTA4HSLC2A1NTRK1NTRK3NTRK2
SCHEMBL30504004 0.81 SYK (0.52) SLC2A1ADORA2AADORA1KMT2AKDM4E
SCHEMBL19612386 0.81 SYK (0.52) SLC2A1ADORA2AADORA1KMT2AKDM4E
SCHEMBL19612375 0.81 LTA4H (0.53) LTA4HKMT2AMAPTMEN1CYP2C9
SCHEMBL9770386 0.80 LTA4H (0.60) LTA4HNTRK1NTRK3NTRK2KMT2A
SCHEMBL19612292 0.79 LTA4H (0.47) LTA4HSLC2A1NTRK1NTRK3NTRK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116360211-A Chemically amplified positive photosensitive resin composition, protective film, and element having protective film 奇美实业股份有限公司 2023-06-30 — — CN disclosed
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