SCHEMBL29025187

SCHEMBL29025187

CCOc1cc(OCC)c2ccccc2c1OCC

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SLC2A1 P11166 2/20 0.50
▸ ALDH1A1 P00352 4/20 0.44
▸ TSHR P16473 3/20 0.43
▸ ADORA1 P30542 2/20 0.42
▸ SYK P43405 1/20 0.42
▸ ADORA2A P29274 1/20 0.42
▸ L3MBTL1 Q9Y468 4/20 0.40
▸ LMNA P02545 2/20 0.40
▸ MAPT P10636 2/20 0.40
▸ NPSR1 Q6W5P4 2/20 0.40
▸ HPGD P15428 1/20 0.40
▸ ALOX12 P18054 1/20 0.40
▸ NTSR1 P30989 1/20 0.40
▸ CCR6 P51684 1/20 0.40
▸ MCL1 Q07820 1/20 0.40
▸ GLA P06280 1/20 0.39
▸ ALOX5 P09917 1/20 0.39
▸ TLR8 Q9NR97 1/20 0.39
▸ NPC1 O15118 1/20 0.38
▸ KDM4E B2RXH2 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19612386 0.91 SYK (0.52) SLC2A1ALDH1A1TSHRADORA1SYK
SCHEMBL30504004 0.91 SYK (0.52) SLC2A1ALDH1A1TSHRADORA1SYK
SCHEMBL19612421 0.86 LTA4H (0.49) SLC2A1ALDH1A1TSHRADORA1SYK
SCHEMBL30504001 0.86 LTA4H (0.49) SLC2A1ALDH1A1TSHRADORA1SYK
SCHEMBL12604011 0.85 HTT (0.47) SLC2A1ALDH1A1TSHRADORA1SYK
SCHEMBL9627470 0.84 HTT (0.59) SLC2A1TSHRL3MBTL1MAPTGLA
SCHEMBL12603983 0.83 L3MBTL1 (0.44) SLC2A1ALDH1A1ADORA1SYKADORA2A
SCHEMBL19809195 0.83 SLC2A1 (0.50) SLC2A1ALDH1A1TSHRADORA1SYK
SCHEMBL9627146 0.83 SLC2A1 (0.50) SLC2A1ALDH1A1TSHRL3MBTL1LMNA
SCHEMBL29779703 0.83 SLC2A1 (0.50) SLC2A1ALDH1A1TSHRADORA1SYK

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116360211-A Chemically amplified positive photosensitive resin composition, protective film, and element having protective film 奇美实业股份有限公司 2023-06-30 — — CN disclosed
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