Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.52 |
| ▸ | HSD17B10 | Q99714 | 7/20 | 0.52 |
| ▸ | TSHR | P16473 | 3/20 | 0.52 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.52 |
| ▸ | ATM | Q13315 | 1/20 | 0.52 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.52 |
| ▸ | CES2 | O00748 | 1/20 | 0.48 |
| ▸ | BCHE | P06276 | 1/20 | 0.48 |
| ▸ | CES1 | P23141 | 1/20 | 0.48 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.48 |
| ▸ | HEXA | P06865 | 3/20 | 0.47 |
| ▸ | HEXB | P07686 | 3/20 | 0.47 |
| ▸ | HPGD | P15428 | 4/20 | 0.46 |
| ▸ | CASP1 | P29466 | 2/20 | 0.46 |
| ▸ | CASP7 | P55210 | 2/20 | 0.46 |
| ▸ | TP53 | P04637 | 1/20 | 0.46 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.46 |
| ▸ | ERCC1 | P07992 | 1/20 | 0.45 |
| ▸ | FEN1 | P39748 | 1/20 | 0.45 |
| ▸ | ERCC4 | Q92889 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15477047 | 0.80 | HSD17B10 (0.47) | ALDH1A1HSD17B10TSHRMAPK1ATM | |
| SCHEMBL17417164 | 0.73 | CES1 (0.54) | ALDH1A1HSD17B10TSHRMAPK1L3MBTL1 | |
| Hydroxyamine SCHEMBL8519859 | 0.73 | ALDH1A1 (0.72) | ALDH1A1HSD17B10TSHRMAPK1ATM | |
| SCHEMBL7767307 | 0.72 | ALDH1A1 (0.55) | ALDH1A1HSD17B10TSHRMAPK1ATM | |
| SCHEMBL17988354 | 0.72 | ALDH1A1 (0.55) | ALDH1A1HSD17B10TSHRMAPK1ATM | |
| Ammonia Solution, Strong SCHEMBL27626211 | 0.72 | ALDH1A1 (0.81) | ALDH1A1HSD17B10TSHRMAPK1ATM | |
| SCHEMBL12485782 | 0.70 | ALDH1A1 (0.60) | ALDH1A1HSD17B10TSHRMAPK1ATM | |
| SCHEMBL23525587 | 0.69 | ALDH1A1 (1.00) | ALDH1A1HSD17B10TSHRMAPK1ATM | |
| Fluoranthene SCHEMBL29355720 | 0.69 | ALDH1A1 (1.00) | ALDH1A1HSD17B10TSHRMAPK1ATM | |
| Fluoranthene SCHEMBL8873541 | 0.69 | ALDH1A1 (1.00) | ALDH1A1HSD17B10TSHRMAPK1ATM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9804492-B2 | Method for forming multi-layer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-10-31 | — | — | US | disclosed |
| US-9785049-B2 | Method for forming multi-layer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-10-10 | — | — | US | disclosed |
| US-20170199457-A1 | METHOD FOR FORMING MULTI-LAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-07-13 | — | — | US | disclosed |
| US-9658530-B2 | Process for forming multi-layer film and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-23 | — | — | US | disclosed |
| US-20160111287-A1 | METHOD FOR FORMING MULTI-LAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-21 | — | — | US | disclosed |
| US-20160008844-A1 | PROCESS FOR FORMING MULTI-LAYER FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-01-14 | — | — | US | disclosed |
| US-8338078-B2 | Photoresist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-12-25 | — | — | US | disclosed |
| US-20100104977-A1 | PHOTORESIST UNDERCOAT-FORMING MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-04-29 | — | — | US | disclosed |