SCHEMBL30529680

SCHEMBL30529680

CCOC(=O)OC1=C2C(=O)c3ccccc3C(OC(=O)OCC)=C2C(=O)c2ccccc21

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 10/20 0.48
LMNA P02545 9/20 0.48
ALDH1A1 P00352 9/20 0.48
SMN1; SMN2 Q16637 6/20 0.48
MEN1 O00255 6/20 0.48
KMT2A Q03164 6/20 0.48
NPSR1 Q6W5P4 6/20 0.48
KDM4E B2RXH2 6/20 0.48
HTT P42858 4/20 0.48
TDP1 Q9NUW8 4/20 0.48
HKDC1 Q2TB90 4/20 0.48
NPC1 O15118 2/20 0.48
RAB9A P51151 2/20 0.48
HSP90AA1 P07900 2/20 0.48
L3MBTL1 Q9Y468 2/20 0.48
TP53 P04637 1/20 0.48
MAPK1 P28482 1/20 0.48
MPI P34949 1/20 0.48
PTPN1 P18031 2/20 0.45
TYMS P04818 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30529732 0.84 ALDH1A1 (0.47) MAPTLMNAALDH1A1SMN1; SMN2MEN1
SCHEMBL30529673 0.82 HSP90AA1 (0.50) MAPTLMNAALDH1A1SMN1; SMN2MEN1
SCHEMBL9793743 0.80 MAPT (0.60) MAPTLMNAALDH1A1SMN1; SMN2MEN1
SCHEMBL10352419 0.79 ELANE (0.49) MAPTLMNAALDH1A1SMN1; SMN2MEN1
SCHEMBL30529736 0.78 NPC1 (0.46) MAPTLMNAALDH1A1SMN1; SMN2MEN1
SCHEMBL26781790 0.77 HSP90AA1 (0.49) MAPTLMNAALDH1A1SMN1; SMN2MEN1
SCHEMBL29371997 0.77 TSHR (0.42) MAPTLMNAALDH1A1SMN1; SMN2MEN1
SCHEMBL10597544 0.76 KMT2A (0.49) MAPTLMNAALDH1A1SMN1; SMN2MEN1
SCHEMBL1960366 0.75 TYMS (0.51) MAPTLMNAALDH1A1MEN1KMT2A
SCHEMBL11110100 0.75 ELANE (0.67) MAPTLMNAALDH1A1SMN1; SMN2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed