Crotonic Acid

Crotonic Acid

SCHEMBL305485

CC=CC(=O)O.OCCO

nearest known ligand 0.44

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.44
TP53 P04637 1/20 0.44
EGLN1 Q9GZT9 1/20 0.44
EGLN3 Q9H6Z9 1/20 0.44
GABRR1 P24046 2/20 0.38
GABRR2 P28476 2/20 0.38
BLM P54132 2/20 0.38
TDP1 Q9NUW8 2/20 0.38
GABRR3 A8MPY1 1/20 0.38
LMNA P02545 1/20 0.38
APEX1 P27695 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
HCAR2 Q8TDS4 6/20 0.37
GABRP O00591 2/20 0.35
GABRD O14764 2/20 0.35
GABRA1 P14867 2/20 0.35
GABRB1 P18505 2/20 0.35
GABRG2 P18507 2/20 0.35
GABRB3 P28472 2/20 0.35
GABRA5 P31644 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Crotonic Acid SCHEMBL10603685 1.00 TSHR (0.44) TSHRTP53EGLN1EGLN3GABRR1
Crotonic Acid SCHEMBL3260978 0.88
Crotonic Acid SCHEMBL5706213 0.88
Crotonic Acid SCHEMBL27508226 0.88 TSHR (0.35) TSHRTP53EGLN1EGLN3GABRR1
Crotonic Acid SCHEMBL167626 0.87 TSHR (0.57) TSHRTP53EGLN1EGLN3GABRR1
Crotonic Acid SCHEMBL22034 0.87
Crotonic Acid SCHEMBL28429 0.87
Crotonic Acid SCHEMBL22033 0.87
Crotonic Acid SCHEMBL1427547 0.87 TSHR (0.57) TSHRTP53EGLN1EGLN3GABRR1
Crotonic Acid SCHEMBL1428157 0.87 TSHR (0.57) TSHRTP53EGLN1EGLN3GABRR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103782241-B Method for recycling waste liquid from plate making process 富士胶片株式会社 2017-04-26 CN disclosed
CN-104497944-A Developable UV cured hydrofluoric acid-resistant protection glue HUIJING DISPLAY TECHNOLOGY SUZHOU CO LTD 2015-04-08 CN disclosed
CN-104497204-A Alkali-soluble resin and alkali-soluble resin-containing UV cured hydrofluoric acid-resistant protection glue composition HUIJING DISPLAY TECHNOLOGY SUZHOU CO LTD 2015-04-08 CN disclosed
CN-103619980-A Adhesive composition, and polarizing plate and liquid crystal display device including same DONGWOO FINE CHEM CO LTD 2014-03-05 CN disclosed
US-8092981-B2 Negative photoresist composition and method of manufacturing array substrate using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-01-10 US disclosed
US-20090176337-A1 NEGATIVE PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-07-09 US disclosed
EP-0183475-B1 COMPOSITE HEAT-INSULATING MATERIALS MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1989-10-04 EP disclosed
US-4725492-A MOLDED POLYOLEFIN LAMINATED TO URETHANE FOAM USING AQUEOUS ADHESIVE OR POLYAMINE AND CATIONIC OR AMPHOTERIC NITROGEN-CONTAINING ACRYLIC POLYMER MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1988-02-16 US disclosed
EP-0183475-A2 Composite heat-insulating materials MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1986-06-04 EP disclosed