Crotonic Acid

Crotonic Acid

SCHEMBL3260978

C/C=C/C(=O)O.CCO

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

MMP1MMP13MMP7MMP8polrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Crotonic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Crotonic Acid SCHEMBL5706213 1.00
Crotonic Acid SCHEMBL27718105 0.91
Crotonic Acid SCHEMBL10603685 0.88 TSHR (0.44)
Crotonic Acid SCHEMBL305485 0.88 TSHR (0.44)
Crotonic Acid SCHEMBL28429 0.87
Crotonic Acid SCHEMBL22034 0.87
Crotonic Acid SCHEMBL1428157 0.87 TSHR (0.57)
Crotonic Acid SCHEMBL22033 0.87
Crotonic Acid SCHEMBL167626 0.87 TSHR (0.57)
Crotonic Acid SCHEMBL1427547 0.87 TSHR (0.57)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8821845-B2 Concentrated ingredient for treating and/or modifying surfaces, and use thereof in cosmetic compositions RHODIA CHIMIE (FR) 2014-09-02 US disclosed
US-8680038-B2 Copolymer containing zwitterionic units and other units, composition comprising the copolymer, and use RHODIA OPERATIONS (FR) 2014-03-25 US disclosed
US-8343520-B2 For treating skin or hair; stability, transparency RHODIA CHIMIE (FR) 2013-01-01 US disclosed
US-20120183590-A1 Cosmetic Composition Comprising An Ampholytic Copolymer RHODIA OPERATIONS (FR) 2012-07-19 US disclosed
US-7846423-B2 Cosmetic composition comprising a block copolymer RHODIA CHIMIE (FR) 2010-12-07 US disclosed
US-20100061956-A1 COSMETIC COMPOSITION COMPRISING AN AMPHOLYTIC COPOLYMER RHODIA CHIMIE (FR) 2010-03-11 US disclosed
US-20090304757-A1 Cosmetic Compositions Comprising A Powdered Thermoplastic RHODIA OPERATIONS (FR) 2009-12-10 US disclosed
EP-1854843-B1 Cosmetic composition comprising a block copolymer RHODIA CHIMIE SA (FR) 2009-09-09 EP disclosed
US-20090214608-A1 POLYSACCHARIDE-BASED PRODUCTS WITH IMPROVED EASINESS OF USE, PROCESS TO MAKE THE SAME, AND APPLICATIONS OF THE SAME RHODIA OPERATIONS (FR) 2009-08-27 US disclosed
US-20090197791-A1 COPOLYMER CONTAINING ZWITTERIONIC UNITS AND OTHER UNITS, COMPOSITION COMPRISING THE COPOLYMER, AND USE RHODIA RECHERCHES ET TECHNOLOGIES (FR) 2009-08-06 US disclosed
US-6660285-B2 Using transparent aqueous cosmetic for rinsing, of at least one amphoteric as an agent for precipitating hydrosoluble or hydrodispersible cationic polymers derived from polysaccharides on dilution during application to the hair RICCA JEAN-MARC (FR) 2003-12-09 US disclosed
US-20030219397-A1 Cosmetic composition comprising a block copolymer RHODIA CHIMIE (FR) 2003-11-27 US disclosed
US-20030139502-A1 Cosmetic compositions comprising a cationic polymer/anionic surfactant mixture and use of said mixture as conditioning agent RHODIA CHIMIE (FR) 2003-07-24 US disclosed
WO-2003050184-A1 COSMETIC COMPOSITION COMPRISING A BLOCK COPOLYMER RHODIA CHIMIE (FR) 2003-06-19 WO disclosed
US-20030086953-A1 Use of amphoteric surfactants in cosmetic compositions to precipitate cationic polymers on dilution RICCA JEAN-MARC (FR) 2003-05-08 US disclosed
US-6509023-B1 Mixture of trisiloxanes containing phenylalkyl or phenyl-alkenyl groups; emollient, vehicle and/or transfer resistance agent; skin, hair Chimie, Rhodia (FR) 2003-01-21 US disclosed
US-6475474-B1 Use in cosmetic compositions of amphoteric surface-active agents for precipitating cationic polymers in the diluted state RHODIA CHIMIE (FR) 2002-11-05 US disclosed
US-6030630-A Cosmetic compositions for the hair or skin based on sulfone copolyesters with polyorganosiloxane units RHODIA CHIMIE (FR) 2000-02-29 US disclosed
US-4648844-A Dental lining composition KURARAY CO., LTD. (JP) 1987-03-10 US disclosed
EP-0195690-A2 Dental lining composition KURARAY CO., LTD. (JP) 1986-09-24 EP disclosed