⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7920310 | 0.84 | — | — | |
| SCHEMBL4173375 | 0.82 | — | — | |
| Methacrylic Acid SCHEMBL27991547 | 0.82 | — | — | |
| SCHEMBL18294094 | 0.78 | OPRM1 (0.31) | — | |
| SCHEMBL7198671 | 0.78 | — | — | |
| SCHEMBL18068563 | 0.75 | — | — | |
| SCHEMBL18068566 | 0.75 | — | — | |
| SCHEMBL7919964 | 0.75 | ALDH1A1 (0.31) | — | |
| SCHEMBL18068556 | 0.74 | — | — | |
| SCHEMBL15299822 | 0.74 | ALDH1A1 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4182379-A1 | DIELECTRIC FILM FORMING COMPOSITIONS | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2023-05-24 | — | — | EP | claimed |
| JP-60170619-A | — | — | None | — | — | JP | disclosed |
| EP-4182379-A1 | DIELECTRIC FILM FORMING COMPOSITIONS | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2023-05-24 | — | — | EP | disclosed |
| US-20180088073-A1 | GAS SENSOR AND METHOD OF MANUFACTURE THEREOF | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2018-03-29 | — | — | US | disclosed |
| US-20180088073-A1 | GAS SENSOR AND METHOD OF MANUFACTURE THEREOF | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2018-03-29 | — | — | US | disclosed |
| US-20180031975-A1 | PATTERN TREATMENT METHODS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-02-01 | — | — | US | disclosed |
| US-20180031975-A1 | PATTERN TREATMENT METHODS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-02-01 | — | — | US | disclosed |
| US-9703203-B2 | Compositions and methods for pattern treatment | DOW GLOBAL TECHNOLOGIES LLC (US) | 2017-07-11 | — | — | US | disclosed |
| US-9703203-B2 | Compositions and methods for pattern treatment | DOW GLOBAL TECHNOLOGIES LLC (US) | 2017-07-11 | — | — | US | disclosed |
| US-9671697-B2 | Pattern treatment methods | DOW GLOBAL TECHNOLOGIES LLC (US) | 2017-06-06 | — | — | US | disclosed |
| US-9122163-B2 | — | — | 2015-09-01 | — | — | US | disclosed |
| US-20140295350-A1 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORP (JP) | 2014-10-02 | — | — | US | disclosed |
| US-8795954-B2 | Resist pattern-forming method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-08-05 | — | — | US | disclosed |
| US-20130224661-A1 | PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20130224666-A1 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2013-08-29 | — | — | US | disclosed |
| US-8298743-B2 | Positive-type photosensitive composition, transparent conductive film, display element and integrated solar battery | FUJIFILM CORPORATION (JP) | 2012-10-30 | — | — | US | disclosed |
| US-20100266956-A1 | POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, TRANSPARENT CONDUCTIVE FILM, DISPLAY ELEMENT AND INTEGRATED SOLAR BATTERY | FUJIFILM CORPORATION (JP) | 2010-10-21 | — | — | US | disclosed |
| US-7662448-B2 | Photosensitive resin composition for column spacers for liquid crystal display device, column spacers formed using the composition and display device comprising the column spacers | CHEIL INDUSTRIES INC. (KR) | 2010-02-16 | — | — | US | disclosed |
| US-20080146694-A1 | Photosensitive Resin Composition for Column Spacers for Liquid Crystal Display Device, Column Spacers Formed Using the Composition and Display Device Comprising the Column Spacers | CHEIL INDUSTRIES INC. (KR) | 2008-06-19 | — | — | US | disclosed |
| JP-S60170619-A | EPOXY RESIN COMPOSITION | HITACHI CHEM CO LTD | 1985-09-04 | — | — | JP | disclosed |