SCHEMBL305992

SCHEMBL305992

C=C(C)C(=O)O[SiH2]C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL261665 0.80 ALDH1A1 (0.52)
SCHEMBL13517871 0.78
SCHEMBL28411732 0.78
SCHEMBL29123757 0.78
SCHEMBL29157685 0.76
SCHEMBL27639955 0.76
SCHEMBL29282718 0.76
SCHEMBL28870733 0.76
SCHEMBL10340727 0.74
SCHEMBL30647511 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 99 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3779260-B1 EXTERNAL PACKAGING MATERIAL FOR VACUUM HEAT INSULATION MATERIAL, VACUUM HEAT INSULATION MATERIAL, AND ARTICLE WITH VACUUM HEAT INSULATION MATERIAL DAINIPPON PRINTING CO LTD (JP) 2024-06-26 EP disclosed
US-20240002705-A1 ADHESIVE COMPOSITION NIPPON SODA CO., LTD. (JP) 2024-01-04 US disclosed
US-11795353-B2 Adhesive composition NIPPON SODA CO., LTD. (JP) 2023-10-24 US disclosed
EP-4155361-A1 ADHESIVE COMPOSITION Nippon Soda Co., Ltd. (JP) 2023-03-29 EP disclosed
EP-3527642-B1 ADHESIVE COMPOSITION NIPPON SODA CO (JP) 2022-12-21 EP disclosed
US-20210284879-A1 ADHESIVE COMPOSITION NIPPON SODA CO., LTD. (JP) 2021-09-16 US disclosed
EP-3779260-A1 EXTERNAL PACKAGING MATERIAL FOR VACUUM HEAT INSULATION MATERIAL, VACUUM HEAT INSULATION MATERIAL, AND ARTICLE WITH VACUUM HEAT INSULATION MATERIAL Dai Nippon Printing Co., Ltd. (JP) 2021-02-17 EP disclosed
US-20200179977-A1 SYNTHESIS OF FUNCTIONAL FLUORINATED POLYHEDRAL OLIGOMERIC SILSESQUIOXANE (\"F-POSS\") GOVERNMENT OF THE UNITED STATES AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE (US) 2020-06-11 US disclosed
US-10550271-B2 Synthesis of functional fluorinated polyhedral oligomeric silsesquioxane (“F-POSS”) UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE (US) 2020-02-04 US disclosed
EP-3527642-A1 ADHESIVE COMPOSITION Nippon Soda Co., Ltd. (JP) 2019-08-21 EP disclosed
CN-1210582-C Method and making contact lenses having UV absorbing properties BAUSCH & LOMB INCORP (US) 2005-07-13 CN disclosed
CN-1537249-A Oxygen Permeable Hard Contact Lenses 可乐丽股份有限公司 2004-10-13 CN disclosed
CN-1162472-C Contact lens material ʿ 2004-08-18 CN disclosed
EP-1386904-A1 Acenaphthylene derivative, polymer, and antireflection film-forming composition JSR Corporation (JP) 2004-02-04 EP disclosed
EP-0965618-B1 Photo-curable composition and photo-cured product JSR CORP (JP) 2004-01-02 EP disclosed
CN-1373794-A Contact lens material BAUSCH & LOMB (US) 2002-10-09 CN disclosed
CN-1301351-A Method and making contact lenses having UV absorbing properties BAUSCH & LOMB INCORP (US) 2001-06-27 CN disclosed
CN-1301352-A Method for making contact lenses having ultraviolet absorbing properties BAUSCH & LOMB INCORP (US) 2001-06-27 CN disclosed
US-6207728-B1 COMPOSITION COMPRISING BOTH HYDROLYZABLE SILANE COMPOUND AND HYDROLYZATE THEREOF OR EITHER ONE, PHOTO ACID GENERATOR, DEHYDRATING AGENT JSR CORPORATION (JP) 2001-03-27 US disclosed
EP-0965618-A1 Photo-curable composition and photo-cured product JSR Corporation (JP) 1999-12-22 EP disclosed