Known targets — ChEMBL curated mechanism
ACHECHKACHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGHRH2OPRM1
The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM2 known ✓ | P08172 | 1/20 | 0.55 |
| ▸ | ADRA2C | P18825 | 2/20 | 0.55 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.55 |
| ▸ | RGS12 | O14924 | 1/20 | 0.55 |
| ▸ | GLA | P06280 | 1/20 | 0.55 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.55 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.55 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.55 |
| ▸ | PKM | P14618 | 1/20 | 0.55 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.55 |
| ▸ | TSHR | P16473 | 1/20 | 0.55 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.55 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.55 |
| ▸ | HTR2A | P28223 | 1/20 | 0.55 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.55 |
| ▸ | THPO | P40225 | 1/20 | 0.55 |
| ▸ | GNAI1 | P63096 | 1/20 | 0.55 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.55 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.54 |
| ▸ | LMNA | P02545 | 3/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3386727 | 0.98 | ADRA2C (0.57) | ADRA2CCHRM2ADRA1ARGS12GLA | |
| SCHEMBL7892362 | 0.98 | ADRA2C (0.57) | ADRA2CCHRM2ADRA1ARGS12GLA | |
| Water SCHEMBL10366292 | 0.96 | ADRA2C (0.55) | ADRA2CCHRM2ADRA1ARGS12GLA | |
| Hydrochloric Acid SCHEMBL3386662 | 0.96 | ADRA2C (0.55) | ADRA2CCHRM2ADRA1ARGS12GLA | |
| Bromide SCHEMBL25252124 | 0.80 | ADRA2C (0.48) | ADRA2CCHRM2ADRA1ARGS12GLA | |
| Bromide SCHEMBL26653709 | 0.80 | ADRA2C (0.48) | ADRA2CCHRM2ADRA1ARGS12GLA | |
| Bromide SCHEMBL6005252 | 0.80 | ADRA2C (0.48) | ADRA2CCHRM2ADRA1ARGS12GLA | |
| Iodide SCHEMBL6742483 | 0.79 | KDM4E (0.55) | ADRA2CCHRM2ADRA1ARGS12GLA | |
| Iodide SCHEMBL6742484 | 0.79 | KDM4E (0.55) | ADRA2CCHRM2ADRA1ARGS12GLA | |
| SCHEMBL26858844 | 0.78 | ADRA2C (0.50) | ADRA2CCHRM2ADRA1ARGS12GLA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4849531-A | Process for the preparation of 2,3-epoxyamides | BAYER AKTIENGESELLSCHAFT (DE) | 1989-07-18 | — | — | US | claimed |
| EP-2755991-B1 | METHOD FOR PREPARATION OF BETULINIC ACID | STORA ENSO OYJ (FI) | 2018-05-16 | — | — | EP | disclosed |
| US-8945816-B2 | Method for forming resist pattern, semiconductor device and production method thereof | FUJITSU LIMITED (JP) | 2015-02-03 | — | — | US | disclosed |
| EP-2787017-A2 | Epoxy resin adducts and thermosets thereof | Dow Global Technologies LLC (US) | 2014-10-08 | — | — | EP | disclosed |
| US-20140275342-A1 | EPOXY RESIN COMPOSITIONS, METHODS OF MAKING SAME, AND ARTICLES THEREOF | DOW GLOBAL TECHNOLOGIES LLC (US) | 2014-09-18 | — | — | US | disclosed |
| US-20140275343-A1 | EPOXY RESIN ADDUCTS AND THERMOSETS THEREOF | DOW GLOBAL TECHNOLOGIES LLC (US) | 2014-09-18 | — | — | US | disclosed |
| EP-2778185-A2 | Epoxy resin compositions, methods of making same, and articles thereof | Dow Global Technologies LLC (US) | 2014-09-17 | — | — | EP | disclosed |
| US-20140179828-A1 | EPOXY RESIN COMPOSITIONS, METHODS OF MAKING SAME, AND ARTICLES THEREOF | DOW GLOBAL TECHNOLOGIES LLC (US) | 2014-06-26 | — | — | US | disclosed |
| EP-2746312-A2 | Epoxy resin compositions, methods of making same, and articles thereof | Dow Global Technologies LLC (US) | 2014-06-25 | — | — | EP | disclosed |
| US-8198009-B2 | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for producing the same | FUJITSU LIMITED (JP) | 2012-06-12 | — | — | US | disclosed |
| EP-1693709-A1 | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same | FUJITSU LIMITED (JP) | 2006-08-23 | — | — | EP | disclosed |
| US-20060073419-A1 | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for producing the same | FUJITSU LIMITED (JP) | 2006-04-06 | — | — | US | disclosed |
| US-20060046446-A1 | Semiconductor device and manufacturing method thereof, and gate electrode and manufacturing method thereof | FUJITSU LIMITED (JP) | 2006-03-02 | — | — | US | disclosed |
| EP-1513013-A2 | Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2005-03-09 | — | — | EP | disclosed |
| US-20050031987-A1 | Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2005-02-10 | — | — | US | disclosed |
| US-4849531-A | Process for the preparation of 2,3-epoxyamides | BAYER AKTIENGESELLSCHAFT (DE) | 1989-07-18 | — | — | US | disclosed |
| US-4442030-A | ARALKYLATION WITH BENZOYLACRYLIC ACID, HYDROGENATION, ESTERIFICATION | MERCK & CO., INC. (US) | 1984-04-10 | — | — | US | disclosed |
| EP-0025846-B1 | IMPROVED PROCESS FOR THE PREPARATION OF VINYLCYCLOPROPANE DERIVATIVES | NATIONAL DISTILLERS AND CHEMICAL CORPORATION (US) | 1984-03-07 | — | — | EP | disclosed |
| EP-0025846-A1 | Improved process for the preparation of vinylcyclopropane derivatives | NATIONAL DISTILLERS AND CHEMICAL CORPORATION (US) | 1981-04-01 | — | — | EP | disclosed |
| US-4252739-A | ALKYLATING AGENT SUCH AS 1,4-DIHALO-2-BUTENE, AN ACTIVE METHYLENE COMPOUND, A CATALYTIC ONIUM COMPOUND, AN ALKALI METAL COMPOUND AND WATER; ONE STEP | EMERY INDUSTRIES, INC. (US) | 1981-02-24 | — | — | US | disclosed |