Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.44 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | TP53 | P04637 | 4/20 | 0.40 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.37 |
| ▸ | CNR1 | P21554 | 1/20 | 0.36 |
| ▸ | CNR2 | P34972 | 1/20 | 0.36 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27497666 | 0.86 | POLB (0.45) | POLBRAB9ATP53MAPTPDK1 | |
| SCHEMBL19970863 | 0.80 | POLB (0.40) | POLBRAB9ATP53MAPTPDK1 | |
| SCHEMBL27497665 | 0.77 | POLB (0.47) | POLBRAB9ATP53MAPTPDK1 | |
| SCHEMBL31385563 | 0.74 | RIPK1 (0.41) | CNR1CNR2 | |
| SCHEMBL27517544 | 0.69 | CNR2 (0.44) | POLBRAB9ATP53MAPTPDK1 | |
| SCHEMBL19970891 | 0.65 | PDK1 (0.39) | POLBRAB9ATP53MAPTPDK1 | |
| SCHEMBL27565956 | 0.65 | TP53 (0.44) | POLBRAB9ATP53MAPTLMNA | |
| SCHEMBL4237595 | 0.62 | CNR2 (0.58) | RAB9ACNR2GAAHTT | |
| SCHEMBL19868597 | 0.62 | MEN1 (0.46) | RAB9ACNR2GAAHTT | |
| SCHEMBL27517543 | 0.62 | CNR2 (0.46) | POLBRAB9ATP53MAPTPDK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113383273-B | Photosensitive resin composition, pattern forming method, cured film, laminate, and device | 富士胶片株式会社 | 2023-11-14 | — | — | CN | disclosed |