Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | USP2 | O75604 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3079512 | 0.88 | TLR8 (0.37) | USP2ALDH1A1HPGDTDP1 | |
| SCHEMBL216358 | 0.79 | — | — | |
| SCHEMBL5533442 | 0.79 | — | — | |
| SCHEMBL2375245 | 0.79 | — | — | |
| SCHEMBL20778 | 0.78 | — | — | |
| SCHEMBL615921 | 0.76 | — | — | |
| SCHEMBL1070455 | 0.76 | — | — | |
| SCHEMBL1278624 | 0.76 | — | — | |
| SCHEMBL3450884 | 0.75 | HTR2A (0.30) | — | |
| SCHEMBL2528409 | 0.75 | MAOA (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024143964-A1 | CURING AGENT COMPOSITION AND CURABLE COMPOSITION CONTAINING SAME | 코오롱인더스트리 주식회사 | 2024-07-04 | — | — | WO | disclosed |
| CN-113195502-A | Macrocyclic influenza endonuclease inhibitors | 詹森生物制药有限公司 | 2021-07-30 | — | — | CN | disclosed |
| CN-110627599-B | Deuterated butyl phthalide compound and application thereof | 海创药业股份有限公司 | 2021-01-15 | — | — | CN | disclosed |
| CN-110627599-A | Deuterated butyl phthalide compound and application thereof | 成都海创药业有限公司 | 2019-12-31 | — | — | CN | disclosed |
| WO-2019242765-A1 | DEUTERATED BUTYL PHTHALIDE COMPOUND AND USE THEREOF | 成都海创药业有限公司 | 2019-12-26 | — | — | WO | disclosed |
| WO-2019141229-A1 | COMPOUND AS PPAR AGONIST AND APPLICATION THEREOF | 上海怡立舍生物技术有限公司 | 2019-07-25 | — | — | WO | disclosed |
| CN-101410421-B | Photopolymerization initiator, photosensitive composition, photosensitive film, photosensitive laminate, method of forming permanent pattern and printed board | FUJI PHOTO FILM CO LTD | 2011-07-27 | — | — | CN | disclosed |
| US-7833331-B2 | Non-toxic corrosion-protection pigments based on cobalt | UNIVERSITY OF DAYTON (US) | 2010-11-16 | — | — | US | disclosed |
| US-7789958-B2 | Non-toxic corrosion-protection pigments based on manganese | UNIVERSITY OF DAYTON (US) | 2010-09-07 | — | — | US | disclosed |
| EP-2097400-A2 | FUSED SUBSTITUTED AMINOPYRROLIDINE DERIVATIVE | Daiichi Sankyo Company, Limited (JP) | 2009-09-09 | — | — | EP | disclosed |
| WO-2003060192-A1 | NON-TOXIC CORROSION-PROTECTION RINSES AND SEALS BASED ON COBALT | UNIVERSITY OF DAYTON (US) | 2003-07-24 | — | — | WO | disclosed |
| WO-2003060191-A2 | NON-TOXIC CORROSION-PROTECTION CONVERSION COATINGES ABSED ON COBALT | UNIVERSITY OF DAYTON (US) | 2003-07-24 | — | — | WO | disclosed |
| CN-1377900-A | Free-radical polymerised compound | FUJI PHOTO FILM CO LTD (JP) | 2002-11-06 | — | — | CN | disclosed |
| US-6416939-B1 | EXPOSURE, HEATING AND DEVELOPMENT | FUJI PHOTO FILM CO., LTD. (JP) | 2002-07-09 | — | — | US | disclosed |
| US-6177360-B1 | Process for manufacture of integrated circuit device | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-01-23 | — | — | US | disclosed |
| EP-1048981-A1 | Negative type image recording material | FUJI PHOTO FILM CO., LTD. (JP) | 2000-11-02 | — | — | EP | disclosed |
| US-5953627-A | Process for manufacture of integrated circuit device | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1999-09-14 | — | — | US | disclosed |
| US-5773197-A | Integrated circuit device and process for its manufacture | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1998-06-30 | — | — | US | disclosed |
| US-5767014-A | DIELECTRIC MATERIAL IS THE REACTION PRODUCT OF A HYPERBRANCED POLYMER AND A POLYSILSESQUIOXANE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1998-06-16 | — | — | US | disclosed |
| EP-0838853-A2 | Integrated circuit device and process for its manufacture | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1998-04-29 | — | — | EP | disclosed |