Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 3/20 | 0.48 |
| ▸ | CA1 | P00915 | 3/20 | 0.48 |
| ▸ | CA9 | Q16790 | 3/20 | 0.48 |
| ▸ | KDM5A | P29375 | 3/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | ALDH2 | P05091 | 1/20 | 0.42 |
| ▸ | PHF8 | Q9UPP1 | 2/20 | 0.41 |
| ▸ | KDM4C | Q9H3R0 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | LMNA | P02545 | 2/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | MMP1 | P03956 | 1/20 | 0.39 |
| ▸ | MMP2 | P08253 | 1/20 | 0.39 |
| ▸ | MMP3 | P08254 | 1/20 | 0.39 |
| ▸ | MMP8 | P22894 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | DRD3 | P35462 | 2/20 | 0.38 |
| ▸ | DRD2 | P14416 | 1/20 | 0.38 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.38 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Alcohol SCHEMBL339969 | 0.94 | CA12 (0.44) | CA12CA1CA9KDM5AALDH1A1 | |
| Hydrogen Peroxide SCHEMBL137833 | 0.93 | KDM5A (0.48) | CA12CA1CA9KDM5AALDH1A1 | |
| Hydrogen Peroxide SCHEMBL137835 | 0.93 | KDM5A (0.48) | CA12CA1CA9KDM5AALDH1A1 | |
| SCHEMBL896 | 0.93 | TSHR (0.46) | CA12CA1CA9KDM5AALDH1A1 | |
| SCHEMBL27566038 | 0.93 | TSHR (0.46) | CA12CA1CA9KDM5AALDH1A1 | |
| SCHEMBL3904839 | 0.93 | TSHR (0.46) | CA12CA1CA9KDM5AALDH1A1 | |
| Alcohol SCHEMBL2290514 | 0.90 | CA12 (0.46) | CA12CA1CA9KDM5AALDH1A1 | |
| SCHEMBL28809066 | 0.90 | CA12 (0.46) | CA12CA1CA9KDM5AALDH1A1 | |
| SCHEMBL11350672 | 0.89 | DNM1 (0.47) | CA12CA1CA9KDM5APHF8 | |
| SCHEMBL6664330 | 0.89 | CA12 (0.43) | CA12CA1CA9KDM5AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6054061-A | HYDROGEN PEROXIDE, INORGANIC ACID, AN AMINE FREE OF A SURFACTANT GROUP A CORROSION INHIBITOR; TREATING A METAL SURFACE TO INCREASE ITS SURFACE ROUGHNESS FOR SUBSEQUENT ADHESION TO A POLYMER LAYER. | SHIPLEY COMPANY, L.L.C. (US) | 2000-04-25 | — | — | US | claimed |
| US-11896738-B2 | Biomimetic electrically conductive hyaluronic acid-based hydrogels | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2024-02-13 | — | — | US | disclosed |
| US-20210283312-A1 | BIOMIMETIC ELECTRICALLY CONDUCTIVE HYALURONIC ACID-BASED HYDROGELS | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2021-09-16 | — | — | US | disclosed |
| CN-107474119-B | Antibacterial aquaporin vesicles and preparation method and application thereof | 宁波日新恒力科技有限公司 | 2020-07-10 | — | — | CN | disclosed |
| US-20180022922-A1 | METHOD FOR PREPARING A COLORANT FOR USE IN A HOT MELT INK | Océ Holding B.V. (NL) | 2018-01-25 | — | — | US | disclosed |
| EP-3272815-A1 | METHOD FOR PREPARING A COLORANT FOR USE IN A HOT MELT INK | OCE Holding B.V. (NL) | 2018-01-24 | — | — | EP | disclosed |
| CN-107474119-A | Antibacterial aquaporin vesica and its preparation method and application | 宁波日新恒力科技有限公司 | 2017-12-15 | — | — | CN | disclosed |
| US-8367312-B2 | Detergent for lithography and method of forming resist pattern with the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-02-05 | — | — | US | disclosed |
| US-7795197-B2 | Cleaning liquid for lithography and method for resist pattern formation | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-09-14 | — | — | US | disclosed |
| US-20090004608-A1 | Detergent For Lithography And Method Of Forming Resist Pattern With The Same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-01-01 | — | — | US | disclosed |
| EP-1948712-A2 | IONIZING RADIATION STABLE THERMOPLASTIC COMPOSITION, METHOD OF MAKING, AND ARTICLES FORMED THEREFROM | General Electric Company (US) | 2008-07-30 | — | — | EP | disclosed |
| US-20080096141-A1 | Cleaning Liquid For Lithography And Method For Resist Pattern Formation | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-04-24 | — | — | US | disclosed |
| EP-1832931-A1 | CLEANING LIQUID FOR LITHOGRAPHY AND METHOD FOR RESIST PATTERN FORMATION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-09-12 | — | — | EP | disclosed |
| WO-2007061672-A2 | IONIZING RADIATION STABLE THERMOPLASTIC COMPOSITION, METHOD OF MAKING, AND ARTICLES FORMED THEREFROM | GENERAL ELECTRIC COMPANY (US) | 2007-05-31 | — | — | WO | disclosed |