SCHEMBL3078801

SCHEMBL3078801

CCCCCC(C)(C)c1cc(Cc2cc(C(C)(C)CC)cc(C(C)(C)CC)c2O)c(O)c(-n2nc3ccccc3n2)c1

nearest known ligand 0.37

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
CNR1 P21554 16/20 0.37
CNR2 P34972 15/20 0.37
GPR18 Q14330 3/20 0.37
GPR55 Q9Y2T6 3/20 0.37
NPC1 O15118 1/20 0.34
RAB9A P51151 1/20 0.34
POLB P06746 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3072179 0.95 CNR1 (0.39) CNR1CNR2GPR18GPR55NPC1
SCHEMBL3077136 0.92 CNR1 (0.37) CNR1CNR2GPR18GPR55NPC1
SCHEMBL258641 0.92 CNR1 (0.41) CNR1CNR2GPR18GPR55NPC1
SCHEMBL3090860 0.90 CNR2 (0.37) CNR1CNR2GPR18GPR55NPC1
SCHEMBL3067221 0.89 NPC1 (0.43) CNR1CNR2GPR18GPR55NPC1
SCHEMBL3075839 0.89 NPC1 (0.38) NPC1RAB9APOLB
SCHEMBL3078799 0.87 NPC1 (0.36) NPC1RAB9APOLB
Bisoctrizole SCHEMBL5994398 0.87 CNR2 (0.39) CNR1CNR2GPR18GPR55NPC1
SCHEMBL551721 0.87 HSPA5 (0.45) CNR1CNR2GPR18GPR55NPC1
SCHEMBL673359 0.86 CNR1 (0.40) CNR1CNR2GPR18GPR55NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5932142-A REACTING 2-HYDROXYPHENYLBENZOTRIAZOLE AND 2,4-DISUBSTITUTED PHENOL WITH AN ALDEHYDE JOHOKU CHEMICAL CO., LTD. (JP) 1999-08-03 US claimed
US-8808951-B2 Electrophotographic photosensitive body HODOGAYA CHEMICAL CO., LTD. (JP) 2014-08-19 US disclosed
EP-1816522-B1 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY HODOGAYA CHEMICAL CO LTD (JP) 2013-12-25 EP disclosed
US-20130266343-A1 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY HODOGAYA CHEMICAL CO LTD (JP) 2013-10-10 US disclosed
EP-2485092-A1 Electrophotographic photosensitive body Hodogaya Chemical Co., Ltd. (JP) 2012-08-08 EP disclosed
US-20100291480-A1 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY HODOGAYA CHEMICAL CO., LTD. (JP) 2010-11-18 US disclosed
US-7790342-B2 Electrophotographic photosensitive body HODOGAYA CHEMICAL CO., LTD. (JP) 2010-09-07 US disclosed
US-20090226830-A1 Using in combination a p-terphenyl compound, N-N'-diphenyl-N,N'-di-p- tolyl-4,4''-diamino-p-terphenyl, as charge transport agent and a polycarbonate homo- and copolymer of bisphenol A or analogues as binder; providing an high photosensitive, improved residual potential and high durability HODOGAYA CHEMICAL CO., LTD. (JP) 2009-09-10 US disclosed
EP-1816522-A1 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY Hodogaya Chemical Co., Ltd. (JP) 2007-08-08 EP disclosed
EP-1077246-B1 Use of benzotriazolyl-alkylene bisphenol compounds as antioxidants for organic materials JOHOKU CHEMICAL CO LTD (JP) 2005-01-26 EP disclosed
US-6790574-B2 HAVING PHOTOSENSITIVE LAYER CONTAINING AS A CHARGE TRANSPORTING MATERIAL AT LEAST ONE INDANE COMPOUND AND AT LEAST ONE POLYCARBONATE RESIN AND/OR AN ORGANIC ADDITIVE CONTAINING NITROGEN OXYGEN, PHOSPHORUS OR SULFUR HODOGAYA CHEMICAL CO., LTD. (JP) 2004-09-14 US disclosed
US-20030203298-A1 Electrophotographic photoreceptor HODOGAYA CHEMICAL CO., LTD. (JP) 2003-10-30 US disclosed
EP-0847997-B1 Process for the preparation of Benzotriazolylalkylene bisphenol compounds JOHOKU CHEMICAL CO LTD (JP) 2002-02-06 EP disclosed
EP-1095956-A2 Thermoset Polyurethane resin and method for the production thereof Mitsui Chemicals, Inc. (JP) 2001-05-02 EP disclosed
EP-1077246-A2 Use of benzotriazolyl-alkylene bisphenol compounds as antioxidants for organic materials Johoku Chemical Co., Ltd. (JP) 2001-02-21 EP disclosed
US-5932142-A REACTING 2-HYDROXYPHENYLBENZOTRIAZOLE AND 2,4-DISUBSTITUTED PHENOL WITH AN ALDEHYDE JOHOKU CHEMICAL CO., LTD. (JP) 1999-08-03 US disclosed
EP-0847997-A1 Benzotriazolyl-alkylene bisphenol compounds, process for their preparation, and stabilized organic materials containing them Johoku Chemical Co., Ltd. (JP) 1998-06-17 EP disclosed