SCHEMBL3067221

SCHEMBL3067221

CCCCCC(C)(C)c1cc(Cc2cc(C)cc(-n3nc4ccccc4n3)c2O)c(O)c(C(C)(C)CCCCC)c1

nearest known ligand 0.43

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 2/20 0.43
RAB9A P51151 2/20 0.43
POLB P06746 1/20 0.40
CNR2 P34972 13/20 0.39
CNR1 P21554 12/20 0.39
LMNA P02545 1/20 0.38
GPR18 Q14330 3/20 0.36
GPR55 Q9Y2T6 3/20 0.36
HSPA5 P11021 1/20 0.36
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
HIF1A Q16665 1/20 0.35
KDM4E B2RXH2 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7932017 0.94 NPC1 (0.46) NPC1RAB9APOLBCNR2CNR1
SCHEMBL3072179 0.94 CNR1 (0.39) NPC1RAB9APOLBCNR2CNR1
SCHEMBL551721 0.91 HSPA5 (0.45) NPC1RAB9APOLBCNR2CNR1
SCHEMBL3077136 0.91 CNR1 (0.37) NPC1RAB9APOLBCNR2CNR1
SCHEMBL3078801 0.89 CNR1 (0.37) NPC1RAB9APOLBCNR2CNR1
SCHEMBL258641 0.89 CNR1 (0.41) NPC1RAB9APOLBCNR2CNR1
SCHEMBL3090860 0.87 CNR2 (0.37) NPC1RAB9ACNR2CNR1GPR18
SCHEMBL3082225 0.87 NPC1 (0.47) NPC1RAB9APOLBLMNAHSPA5
SCHEMBL3067219 0.86 NPC1 (0.46) NPC1RAB9APOLBLMNAHSPA5
SCHEMBL673359 0.86 CNR1 (0.40) NPC1RAB9APOLBCNR2CNR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8808951-B2 Electrophotographic photosensitive body HODOGAYA CHEMICAL CO., LTD. (JP) 2014-08-19 US disclosed
EP-1816522-B1 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY HODOGAYA CHEMICAL CO LTD (JP) 2013-12-25 EP disclosed
US-20130266343-A1 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY HODOGAYA CHEMICAL CO LTD (JP) 2013-10-10 US disclosed
EP-2485092-A1 Electrophotographic photosensitive body Hodogaya Chemical Co., Ltd. (JP) 2012-08-08 EP disclosed
US-20100291480-A1 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY HODOGAYA CHEMICAL CO., LTD. (JP) 2010-11-18 US disclosed
US-7790342-B2 Electrophotographic photosensitive body HODOGAYA CHEMICAL CO., LTD. (JP) 2010-09-07 US disclosed
US-20090226830-A1 Using in combination a p-terphenyl compound, N-N'-diphenyl-N,N'-di-p- tolyl-4,4''-diamino-p-terphenyl, as charge transport agent and a polycarbonate homo- and copolymer of bisphenol A or analogues as binder; providing an high photosensitive, improved residual potential and high durability HODOGAYA CHEMICAL CO., LTD. (JP) 2009-09-10 US disclosed
EP-1816522-A1 ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY Hodogaya Chemical Co., Ltd. (JP) 2007-08-08 EP disclosed
EP-1077246-B1 Use of benzotriazolyl-alkylene bisphenol compounds as antioxidants for organic materials JOHOKU CHEMICAL CO LTD (JP) 2005-01-26 EP disclosed
US-6790574-B2 HAVING PHOTOSENSITIVE LAYER CONTAINING AS A CHARGE TRANSPORTING MATERIAL AT LEAST ONE INDANE COMPOUND AND AT LEAST ONE POLYCARBONATE RESIN AND/OR AN ORGANIC ADDITIVE CONTAINING NITROGEN OXYGEN, PHOSPHORUS OR SULFUR HODOGAYA CHEMICAL CO., LTD. (JP) 2004-09-14 US disclosed
US-20030203298-A1 Electrophotographic photoreceptor HODOGAYA CHEMICAL CO., LTD. (JP) 2003-10-30 US disclosed
EP-0847997-B1 Process for the preparation of Benzotriazolylalkylene bisphenol compounds JOHOKU CHEMICAL CO LTD (JP) 2002-02-06 EP disclosed
EP-1095956-A2 Thermoset Polyurethane resin and method for the production thereof Mitsui Chemicals, Inc. (JP) 2001-05-02 EP disclosed
EP-1077246-A2 Use of benzotriazolyl-alkylene bisphenol compounds as antioxidants for organic materials Johoku Chemical Co., Ltd. (JP) 2001-02-21 EP disclosed
US-5932142-A REACTING 2-HYDROXYPHENYLBENZOTRIAZOLE AND 2,4-DISUBSTITUTED PHENOL WITH AN ALDEHYDE JOHOKU CHEMICAL CO., LTD. (JP) 1999-08-03 US disclosed
EP-0847997-A1 Benzotriazolyl-alkylene bisphenol compounds, process for their preparation, and stabilized organic materials containing them Johoku Chemical Co., Ltd. (JP) 1998-06-17 EP disclosed