SCHEMBL307900

SCHEMBL307900

Brc1ccccc1-c1nc(-c2ccccc2)c(-c2ccccc2)n1C1(c2ccccc2Br)N=C(c2ccccc2)C(c2ccccc2)=N1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 3/20 0.34
MAPT P10636 2/20 0.34
RAB9A P51151 2/20 0.34
TDP1 Q9NUW8 2/20 0.34
NPC1 O15118 1/20 0.34
CASP3 P42574 1/20 0.34
SENP8 Q96LD8 1/20 0.34
SENP7 Q9BQF6 1/20 0.34
SENP6 Q9GZR1 1/20 0.34
ALDH1A1 P00352 2/20 0.34
AKT1 P31749 3/20 0.33
AKT2 P31751 3/20 0.33
BCHE P06276 1/20 0.33
ACHE P22303 1/20 0.33
PDE10A Q9Y233 1/20 0.32
L3MBTL1 Q9Y468 2/20 0.32
TP53 P04637 1/20 0.32
NFKB1 P19838 1/20 0.32
NFKB2 Q00653 1/20 0.32
RELA Q04206 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29618231 1.00 MAPK1 (0.34) MAPK1MAPTRAB9ATDP1NPC1
SCHEMBL17133349 0.87 BCHE (0.36) MAPK1MAPTRAB9ATDP1NPC1
SCHEMBL1865434 0.85 FABP4 (0.35) MAPK1MAPTRAB9ATDP1NPC1
SCHEMBL1865917 0.84 FABP4 (0.33) MAPK1MAPTRAB9ANPC1ALDH1A1
SCHEMBL29392749 0.84 MGAM (0.34) AKT1AKT2BCHEACHE
SCHEMBL476661 0.84 MGAM (0.34) AKT1AKT2BCHEACHE
SCHEMBL1864872 0.84 AKT1 (0.40) MAPK1MAPTRAB9ANPC1ALDH1A1
SCHEMBL1061109 0.82 AKT1 (0.42) MAPK1MAPTALDH1A1AKT1AKT2
SCHEMBL29604013 0.82 AKT1 (0.42) MAPK1MAPTALDH1A1AKT1AKT2
SCHEMBL30343795 0.82 AKT1 (0.36) RAB9ATDP1NPC1ALDH1A1AKT1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 177 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7932300-B2 Energy beam curable type ink jet printing ink JSR CORPORATION (JP) 2011-04-26 US claimed
US-20240206322-A1 OPTICAL SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME, SOLID-STATE IMAGING DEVICE, AND ELECTRONIC DEVICE KANEKA CORPORATION (JP) 2024-06-20 US disclosed
EP-4223746-A1 POLYMERIZABLE COMPOUND, POLYMERIZABLE COMPOSITION, POLYMER, AND OPTICALLY ANISOTROPIC MATERIAL Zeon Corporation (JP) 2023-08-09 EP disclosed
EP-3483141-B1 POLYMERIZABLE COMPOUND, POLYMERIZABLE COMPOSITION, POLYMER, AND OPTICALLY ANISOTROPIC MATERIAL ZEON CORP (JP) 2023-07-19 EP disclosed
US-20230002562-A1 POLYSILOXANE COPOLYMER, METHOD FOR PREPARING THE SAME AND RESIN COMPOSITION INCLUDING THE SAME HUNETPLUS CO., LTD. (KR) 2023-01-05 US disclosed
US-11492552-B2 Polymerizable liquid crystal material, polymerizable liquid crystal composition, polymer, optical film, optically anisotropic body, polarizing plate, anti-reflection film, display device, and method of producing polymerizable liquid crystal composition ZEON CORPORATION (JP) 2022-11-08 US disclosed
WO-2022210798-A1 OPTICAL SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME, SOLID-STATE IMAGING DEVICE, AND ELECTRONIC APPARATUS 株式会社カネカ 2022-10-06 WO disclosed
WO-2022196987-A1 ADHESIVE COMPOSITION, AND ADHESIVE SHEET, OPTICAL MEMBER, AND DISPLAY APPARATUS PRODUCED USING SAME 동우 화인켐 주식회사 2022-09-22 WO disclosed
WO-2022186641-A1 ADHESIVE COMPOSITION, ADHESIVE SHEET PREPARED BY USING SAME, OPTICAL MEMBER, AND DISPLAY DEVICE 동우 화인켐 주식회사 2022-09-09 WO disclosed
WO-2022181403-A1 PHOTOSENSITIVE COLORED RESIN COMPOSITION, CURED PRODUCT, COLOR FILTER, AND DISPLAY DEVICE 株式会社DNPファインケミカル 2022-09-01 WO disclosed
US-6756165-B2 ALKALI SOLUBLE RESIN, UNSATURATED POLYMERIZABLE COMPOUND, RADIATION SENSITIVE POLYMERIZATION INITIATOR JSR CORPORATION (JP) 2004-06-29 US disclosed
US-6368774-B1 MIXTURE CONTAINING ISOINDOLININE DYE JSR CORPORATION (JP) 2002-04-09 US disclosed
US-6348298-B1 COMPOSITION CONSISTING OF COLORANT CONTAINING PHTHALOCYANINE BLUE AND PHTHALOCYANINE GREEN OR PIGMENT GREEN 36, ALKALI-SOLUBLE RESIN, POLYFUNCTIONAL MONOMER, AND PHOTOPOLYMERIZATION INITIATOR JSR CORPORATION (JP) 2002-02-19 US disclosed
US-20010044075-A1 Radiation sensitive resin composition for forming barrier ribs for an EL display element, barrier rib and EL display element JSR CORPORATION (JP) 2001-11-22 US disclosed
EP-1150165-A1 Radiation sensitive resin composition for forming barrier ribs for an el display element, barrier ribs and el display element JSR Corporation (JP) 2001-10-31 EP disclosed
US-6140019-A Radiation sensitive composition JSR CORPORATION (JP) 2000-10-31 US disclosed
EP-1033626-A1 Radiation sensitive composition JSR Corporation (JP) 2000-09-06 EP disclosed
EP-1033625-A1 Radiation sensitive composition JSR Corporation (JP) 2000-09-06 EP disclosed
US-6013415-A Radiation sensitive composition JSR CORPORATION (JP) 2000-01-11 US disclosed
EP-0893737-A2 Radiation sensitive composition JSR Corporation (JP) 1999-01-27 EP disclosed