Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MGAM | O43451 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | SI | P14410 | 1/20 | 0.34 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.34 |
| ▸ | DCLK1 | O15075 | 1/20 | 0.32 |
| ▸ | PRKD3 | O94806 | 1/20 | 0.32 |
| ▸ | MAP4K4 | O95819 | 1/20 | 0.32 |
| ▸ | CHEK2 | O96017 | 1/20 | 0.32 |
| ▸ | CSF1R | P07333 | 1/20 | 0.32 |
| ▸ | FER | P16591 | 1/20 | 0.32 |
| ▸ | CDK2 | P24941 | 1/20 | 0.32 |
| ▸ | MARK3 | P27448 | 1/20 | 0.32 |
| ▸ | FLT4 | P35916 | 1/20 | 0.32 |
| ▸ | FLT3 | P36888 | 1/20 | 0.32 |
| ▸ | MAPK9 | P45984 | 1/20 | 0.32 |
| ▸ | CSNK1D | P48730 | 1/20 | 0.32 |
| ▸ | CLK2 | P49760 | 1/20 | 0.32 |
| ▸ | CSNK2A1 | P68400 | 1/20 | 0.32 |
| ▸ | CSNK1G2 | P78368 | 1/20 | 0.32 |
| ▸ | MAP4K2 | Q12851 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29392749 | 1.00 | MGAM (0.34) | MGAMGAASIMGAM2DCLK1 | |
| SCHEMBL1871953 | 0.86 | AKT1 (0.32) | AKT2KMT2AAKT1 | |
| SCHEMBL29618231 | 0.84 | MAPK1 (0.34) | AKT2AKT1BCHEACHE | |
| SCHEMBL307900 | 0.84 | MAPK1 (0.34) | AKT2AKT1BCHEACHE | |
| SCHEMBL1867195 | 0.83 | MMP2 (0.38) | MGAMGAASIMGAM2AKT2 | |
| SCHEMBL1062076 | 0.81 | AKT1 (0.39) | AKT2ATMAKT1 | |
| SCHEMBL29893456 | 0.81 | AKT1 (0.39) | AKT2ATMAKT1 | |
| SCHEMBL1869867 | 0.79 | BCHE (0.32) | AKT2AKT1BCHEACHE | |
| SCHEMBL17133349 | 0.79 | BCHE (0.36) | GAAAKT2MEN1KMT2AAKT1 | |
| SCHEMBL1614534 | 0.77 | ALDH1A1 (0.37) | MGAMGAASIMGAM2AKT2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 295 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7932300-B2 | Energy beam curable type ink jet printing ink | JSR CORPORATION (JP) | 2011-04-26 | — | — | US | claimed |
| US-6120973-A | PHOTOSENSITIVE COMPOSITION AND COLORS WITH POLYMERS | JSR CORPORATION (JP) | 2000-09-19 | — | — | US | claimed |
| US-6087050-A | Radiation sensitive composition and color filter | JSR CORPORATION (JP) | 2000-07-11 | — | — | US | claimed |
| EP-0902327-A2 | Radiation sensitive composition | JSR Corporation (JP) | 1999-03-17 | — | — | EP | claimed |
| EP-0881541-A1 | Radiation sensitive composition and color filter | JSR Corporation (JP) | 1998-12-02 | — | — | EP | claimed |
| WO-2026100662-A1 | LIQUID CRYSTAL ALIGNING AGENT AND LIQUID CRYSTAL DISPLAY ELEMENT | 日産化学株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2025127098-A1 | PHASE DIFFERENCE FILM COMPOSITION AND SINGLE-LAYER PHASE DIFFERENCE MATERIAL | 日産化学株式会社 | 2025-06-19 | — | — | WO | disclosed |
| US-12281235-B2 | Photocurable composition, inkjet ink composition, active energy ray-curable ink composition, cured product, and electronic component | JNC CORPORATION (JP) | 2025-04-22 | — | — | US | disclosed |
| WO-2025047023-A1 | SILICONE-CONTAINING COPOLYMER, METHOD FOR PRODUCING SAME, CURABLE RESIN COMPOSITION, AND CURED PRODUCT | JNC株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2025033304-A1 | METHOD FOR MANUFACTURING LIQUID CRYSTAL ALIGNMENT FILM, AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY ELEMENT | 日産化学株式会社 | 2025-02-13 | — | — | WO | disclosed |
| WO-2025018147-A1 | FLUORINATED ARYLSULFONATE POLYMER COMPOUND AND USE OF SAME | 日産化学株式会社 | 2025-01-23 | — | — | WO | disclosed |
| WO-2024162343-A1 | SINGLE-LAYER PHASE DIFFERENCE MATERIAL AND PHASE DIFFERENCE FILM | 日産化学株式会社 | 2024-08-08 | — | — | WO | disclosed |
| EP-1033626-A1 | Radiation sensitive composition | JSR Corporation (JP) | 2000-09-06 | — | — | EP | disclosed |
| US-6087050-A | Radiation sensitive composition and color filter | JSR CORPORATION (JP) | 2000-07-11 | — | — | US | disclosed |
| US-6013415-A | Radiation sensitive composition | JSR CORPORATION (JP) | 2000-01-11 | — | — | US | disclosed |
| EP-0902327-A2 | Radiation sensitive composition | JSR Corporation (JP) | 1999-03-17 | — | — | EP | disclosed |
| EP-0893737-A2 | Radiation sensitive composition | JSR Corporation (JP) | 1999-01-27 | — | — | EP | disclosed |
| EP-0881541-A1 | Radiation sensitive composition and color filter | JSR Corporation (JP) | 1998-12-02 | — | — | EP | disclosed |
| EP-0875788-A1 | Radiation sensitive composition for color filters | JSR Corporation (JP) | 1998-11-04 | — | — | EP | disclosed |
| EP-0866367-A2 | Radiation sensitive composition | JSR Corporation (JP) | 1998-09-23 | — | — | EP | disclosed |