SCHEMBL30823687

SCHEMBL30823687

O=C(O)c1c(F)c(Oc2c(F)c(F)c(F)c(F)c2F)c(O)c(Oc2c(F)c(F)c(F)c(F)c2F)c1F

nearest known ligand 0.33

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 3/20 0.33
▸ KMT2A Q03164 3/20 0.33
▸ CYP2C9 P11712 2/20 0.33
▸ CYP1A2 P05177 1/20 0.33
▸ HSD17B10 Q99714 1/20 0.33
▸ HPGD P15428 1/20 0.32
▸ HTT P42858 1/20 0.32
▸ TSHR P16473 2/20 0.32
▸ SMN1; SMN2 Q16637 2/20 0.32
▸ POLB P06746 1/20 0.31
▸ MAPT P10636 1/20 0.31
▸ TDP1 Q9NUW8 1/20 0.31
▸ L3MBTL1 Q9Y468 1/20 0.31
▸ GFER P55789 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22766208 0.87 MEN1 (0.37) MEN1KMT2ACYP2C9CYP1A2HSD17B10
SCHEMBL20262187 0.83 MEN1 (0.35) MEN1KMT2ACYP2C9CYP1A2HSD17B10
SCHEMBL29405294 0.82 MEN1 (0.37) MEN1KMT2ACYP2C9CYP1A2HSD17B10
SCHEMBL3646838 0.82 MEN1 (0.37) MEN1KMT2ACYP2C9CYP1A2HSD17B10
SCHEMBL714064 0.82 MEN1 (0.37) MEN1KMT2ACYP2C9CYP1A2HSD17B10
SCHEMBL8576244 0.77 MEN1 (0.34) MEN1KMT2ACYP2C9CYP1A2HSD17B10
SCHEMBL712618 0.77 MEN1 (0.34) MEN1KMT2ACYP2C9CYP1A2HSD17B10
SCHEMBL29962959 0.76 MEN1 (0.36) MEN1KMT2ACYP2C9CYP1A2HSD17B10
SCHEMBL3135197 0.75 — —
SCHEMBL4594690 0.75 MEN1 (0.33) MEN1KMT2ACYP2C9CYP1A2HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025018368-A1 ADHESIVE COMPOSITION, ADHESIVE FILM FOR CIRCUIT CONNECTION, CONNECTED STRUCTURE, AND METHOD FOR PRODUCING CONNECTED STRUCTURE 株式会社レゾナック 2025-01-23 — — WO disclosed
WO-2024262499-A1 PATTERN INVERTING PHOTOCURABLE COMPOSITION, AND METHOD FOR PRODUCING ELECTRONIC DEVICE OR OPTICAL DEVICE USING SAME サンアプロ株式会社 2024-12-26 — — WO disclosed
WO-2024177001-A1 SULFONIUM SALT AND ACID GENERATOR CONTAINING SAID SULFONIUM SALT サンアプロ株式会社 2024-08-29 — — WO disclosed
WO-2024042952-A1 ACID GENERATOR, CURABLE COMPOSITION CONTAINING SAID ACID GENERATOR, AND CURED PRODUCT OF SAME サンアプロ株式会社 2024-02-29 — — WO disclosed
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