SCHEMBL30827114

SCHEMBL30827114

Oc1ccc(-c2cccc3ccccc23)c2ccccc12

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.62
IDO1 P14902 3/20 0.59
PTPN22 Q9Y2R2 1/20 0.52
MCL1 Q07820 1/20 0.50
ACMSD Q8TDX5 1/20 0.50
POLB P06746 1/20 0.48
HSD17B10 Q99714 3/20 0.47
USP2 O75604 1/20 0.47
PAK1 Q13153 1/20 0.47
CYP2C9 P11712 1/20 0.47
CYP2C19 P33261 1/20 0.47
HDAC3 O15379 1/20 0.46
EP300 Q09472 1/20 0.46
KAT2B Q92831 1/20 0.46
KAT8 Q9H7Z6 1/20 0.46
NCOR2 Q9Y618 1/20 0.46
TRPM4 Q8TD43 1/20 0.46
MAPT P10636 2/20 0.44
TSHR P16473 2/20 0.44
TDP1 Q9NUW8 2/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11504207 1.00 CYP1A2 (0.62) CYP1A2IDO1PTPN22MCL1ACMSD
SCHEMBL1890061 0.90 MCL1 (0.58) CYP1A2IDO1PTPN22MCL1ACMSD
SCHEMBL6077039 0.85 ALDH1A1 (0.56) CYP1A2POLBHSD17B10MAPTTSHR
SCHEMBL13265824 0.85 IDO1 (0.81) CYP1A2IDO1PTPN22POLBHSD17B10
SCHEMBL442916 0.85 IDO1 (0.81) CYP1A2IDO1PTPN22POLBHSD17B10
SCHEMBL30214159 0.84 CYP1A2 (0.65) CYP1A2IDO1PTPN22MCL1ACMSD
SCHEMBL217637 0.84 CYP1A2 (0.65) CYP1A2IDO1PTPN22MCL1ACMSD
SCHEMBL3915265 0.84 CYP1A2 (0.48) CYP1A2IDO1PTPN22MCL1ACMSD
SCHEMBL25302086 0.83 ALDH1A1 (0.59) CYP1A2POLBHSD17B10MAPTTSHR
SCHEMBL29350007 0.83 ALDH1A1 (0.59) CYP1A2POLBHSD17B10MAPTTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119452307-A Resist auxiliary film composition and pattern forming method using the same 三菱瓦斯化学株式会社 2025-02-14 CN disclosed
CN-117769684-A Resist auxiliary film composition and pattern forming method using the same 三菱瓦斯化学株式会社 2024-03-26 CN disclosed
CN-117716290-A Resist composition and method for forming resist film using the same 三菱瓦斯化学株式会社 2024-03-15 CN disclosed