Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSC | P53634 | 1/20 | 0.51 |
| ▸ | CMA1 | P23946 | 1/20 | 0.49 |
| ▸ | REN | P00797 | 1/20 | 0.48 |
| ▸ | TRHR | P34981 | 1/20 | 0.47 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.46 |
| ▸ | ACE | P12821 | 5/20 | 0.46 |
| ▸ | ACE2 | Q9BYF1 | 4/20 | 0.46 |
| ▸ | F2 | P00734 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30630986 | 0.90 | REN (0.56) | CTSCCMA1RENTRHROPRM1 | |
| SCHEMBL29878760 | 0.89 | ACE (0.56) | CTSCACEACE2 | |
| SCHEMBL29580266 | 0.86 | CMA1 (0.54) | CTSCCMA1RENOPRM1 | |
| SCHEMBL31406958 | 0.85 | ACE (0.39) | CTSCCMA1RENTRHRACE | |
| SCHEMBL30892689 | 0.85 | ACE (0.52) | CTSCRENACEACE2 | |
| SCHEMBL31741272 | 0.84 | SLC6A2 (0.55) | RENOPRM1 | |
| SCHEMBL10777748 | 0.84 | REN (0.51) | RENACEACE2 | |
| SCHEMBL30862340 | 0.83 | REN (0.49) | RENOPRM1 | |
| SCHEMBL31005430 | 0.83 | REN (0.61) | REN | |
| SCHEMBL31122220 | 0.82 | PSMB9 (0.46) | CTSCCMA1RENACEACE2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117778119-A | Cleaning agent for chip after chemical mechanical polishing and preparation method and application thereof | 江苏奥首材料科技有限公司 | 2024-03-29 | — | — | CN | claimed |
| CN-117778119-A | Cleaning agent for chip after chemical mechanical polishing and preparation method and application thereof | 江苏奥首材料科技有限公司 | 2024-03-29 | — | — | CN | disclosed |