SCHEMBL30835362

SCHEMBL30835362

C=CC(=O)N(C)C.C=CP(=O)(O)O

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15015 0.84
Pyrophosphoric Acid SCHEMBL27945058 0.82 FDPS (0.43) ALDH1A1
SCHEMBL253241 0.82
Ammonia Solution, Strong SCHEMBL28343242 0.82
SCHEMBL30060802 0.82
Hydrochloric Acid SCHEMBL8593624 0.82
Ammonia Solution, Strong SCHEMBL16774831 0.82
Methane SCHEMBL10717295 0.82
Bromide SCHEMBL31360976 0.82 ALDH1A1 (0.42) ALDH1A1
Ethane SCHEMBL10637100 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250215361-A1 TREATMENT LIQUID FOR MANUFACTURING SEMICONDUCTOR, CLEANING METHOD OF OBJECT TO BE TREATED, AND MANUFACTURING METHOD OF SEMICONDUCTOR FUJIFILM CORPORATION (JP) 2025-07-03 US disclosed
CN-119948604-A Treatment liquid for semiconductor manufacture, method for cleaning object to be treated, and method for manufacturing semiconductor 富士胶片株式会社 2025-05-06 CN disclosed
WO-2024071182-A1 SEMICONDUCTOR MANUFACTURING TREATMENT LIQUID, TREATED OBJECT WASHING METHOD, AND SEMICONDUCTOR MANUFACTURING METHOD 富士フイルム株式会社 2024-04-04 WO disclosed