⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3906050 | 0.80 | — | — | |
| SCHEMBL10383109 | 0.80 | — | — | |
| SCHEMBL722339 | 0.78 | — | — | |
| SCHEMBL10382404 | 0.78 | — | — | |
| Hydrochloric Acid SCHEMBL29518338 | 0.76 | — | — | |
| SCHEMBL13970223 | 0.76 | — | — | |
| SCHEMBL22238208 | 0.75 | — | — | |
| SCHEMBL10833880 | 0.72 | DNM1 (0.57) | — | |
| SCHEMBL4203081 | 0.72 | CHRM2 (0.38) | — | |
| SCHEMBL8588191 | 0.72 | CHRM1 (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110622071-A | Dry film photoresistance stripping liquid composition | LTC有限公司 | 2019-12-27 | — | — | CN | claimed |
| US-7795685-B2 | Method of manufacturing a thin film transistor substrate and stripping composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-09-14 | — | — | US | claimed |
| US-20080039354-A1 | METHOD OF MANUFACTURING A THIN FILM TRANSISTOR SUBSTRATE AND STRIPPING COMPOSITION | SAMSUNG ELECTRONICS CO., LTD (KR) | 2008-02-14 | — | — | US | claimed |
| US-7300827-B2 | Method of manufacturing a thin film transistor substrate and stripping composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-11-27 | — | — | US | claimed |
| US-20060046365-A1 | Method of manufacturing a thin film transistor substrate and stripping composition | TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. (CN) | 2006-03-02 | — | — | US | claimed |
| US-11926785-B2 | Processing produced fluids for fluid recovery | HALLIBURTON ENERGY SERVICES, INC. (US) | 2024-03-12 | — | — | US | disclosed |
| WO-2024005988-A1 | CATALYST FOR CARBONYL SULFIDE REMOVAL FROM HYDROCARBONS | MERICHEM COMPANY (US) | 2024-01-04 | — | — | WO | disclosed |
| US-20230416088-A1 | CATALYST FOR CARBONYL SULFIDE REMOVAL FROM HYDROCARBONS | MERICHEM COMPANY (US) | 2023-12-28 | — | — | US | disclosed |
| US-20230035837-A1 | ANTIBIOTIC COMPOUNDS, METHODS OF MANUFACTURING THE SAME, PHARMACEUTICAL COMPOSITIONS CONTAINING THE SAME AND USES THEREOF | DEBIOPHARM INTERNATIONAL S.A. (CH) | 2023-02-02 | — | — | US | disclosed |
| US-11384272-B2 | Processing produced fluids for fluid recovery | MULTI-CHEM GROUP, LLC (US) | 2022-07-12 | — | — | US | disclosed |
| US-11352319-B2 | Method for producing carbamate and method for producing isocyanate | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2022-06-07 | — | — | US | disclosed |
| US-20210179548-A1 | METHOD FOR PRODUCING CARBAMATE AND METHOD FOR PRODUCING ISOCYANATE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2021-06-17 | — | — | US | disclosed |
| US-20060046365-A1 | Method of manufacturing a thin film transistor substrate and stripping composition | TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. (CN) | 2006-03-02 | — | — | US | disclosed |
| US-20040217006-A1 | Residue removers for electrohydrodynamic cleaning of semiconductors | EKC TECHNOLOGY, INC. | 2004-11-04 | — | — | US | disclosed |
| EP-0656405-B1 | Aqueous stripping compositions containing a hydroxylamine and an alkanolamine and use thereof | AIR PROD & CHEM (US) | 2004-07-14 | — | — | EP | disclosed |
| EP-0702071-B1 | Two-pack aqueous adhesive | SUNSTAR ENGINEERING INC (JP) | 2001-05-30 | — | — | EP | disclosed |
| US-5726242-A | POLYCARBONATEURETHANE, LOW TEMPERATURE LAMINATION OF COMPLEX SHAPES | SUNSTAR GIKEN KABUSHIKI KAISHA (JP) | 1998-03-10 | — | — | US | disclosed |
| EP-0723205-A1 | Removing agent composition and method of removing photoresist using the same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1996-07-24 | — | — | EP | disclosed |
| EP-0702071-A2 | Two-pack aqueous adhesive | SUNSTAR GIKEN KABUSHIKI KAISHA (JP) | 1996-03-20 | — | — | EP | disclosed |
| EP-0656405-A2 | Aqueous stripping compositions containing a hydroxylamine and an alkanolamine and use thereof | ASHLAND OIL, INC. (US) | 1995-06-07 | — | — | EP | disclosed |