Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SRD5A2 | P31213 | 3/20 | 0.59 |
| ▸ | FEN1 | P39748 | 2/20 | 0.57 |
| ▸ | CAMKK2 | Q96RR4 | 1/20 | 0.57 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.57 |
| ▸ | NCOA1 | Q15788 | 1/20 | 0.56 |
| ▸ | NCOA3 | Q9Y6Q9 | 1/20 | 0.56 |
| ▸ | RXRA | P19793 | 1/20 | 0.55 |
| ▸ | RXRB | P28702 | 1/20 | 0.55 |
| ▸ | RXRG | P48443 | 1/20 | 0.55 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.53 |
| ▸ | PARP10 | Q53GL7 | 2/20 | 0.51 |
| ▸ | PARP15 | Q460N3 | 1/20 | 0.51 |
| ▸ | TTR | P02766 | 1/20 | 0.49 |
| ▸ | GSTP1 | P09211 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30856503 | 0.98 | FFAR4 (0.58) | SRD5A2FEN1CAMKK2FFAR4NCOA1 | |
| SCHEMBL21178076 | 0.95 | NCOA1 (0.58) | SRD5A2FEN1CAMKK2FFAR4NCOA1 | |
| SCHEMBL4326298 | 0.95 | NCOA1 (0.62) | SRD5A2FEN1CAMKK2FFAR4NCOA1 | |
| SCHEMBL9422294 | 0.90 | SRD5A2 (0.61) | SRD5A2FEN1CAMKK2NCOA1NCOA3 | |
| SCHEMBL2710776 | 0.88 | SRD5A2 (0.65) | SRD5A2RXRARXRBRXRGPARP10 | |
| SCHEMBL2710772 | 0.88 | SRD5A2 (0.59) | SRD5A2FEN1CAMKK2NCOA1NCOA3 | |
| SCHEMBL25343498 | 0.87 | CYP2C8 (0.53) | SRD5A2FEN1CAMKK2FFAR4NCOA1 | |
| SCHEMBL258244 | 0.87 | FEN1 (0.50) | SRD5A2FEN1CAMKK2FFAR4NCOA1 | |
| SCHEMBL30519278 | 0.87 | CYP2C8 (0.53) | SRD5A2FEN1CAMKK2FFAR4NCOA1 | |
| SCHEMBL5669722 | 0.85 | FEN1 (0.48) | SRD5A2FEN1CAMKK2FFAR4NCOA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113527101-B | Novel compound, polymer, process for producing the same, photosensitive resin composition, pattern forming process, cured film, and electronic component | 信越化学工业株式会社 | 2024-04-23 | — | — | CN | disclosed |