SCHEMBL9422294

SCHEMBL9422294

O=C(O)c1ccc(Oc2ccccc2-c2ccccc2Oc2ccc(C(=O)O)cc2)cc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SRD5A2 P31213 3/20 0.61
TTR P02766 2/20 0.54
PARP10 Q53GL7 3/20 0.53
PARP15 Q460N3 1/20 0.53
FEN1 P39748 2/20 0.52
PKM P14618 1/20 0.52
LPAR1 Q92633 2/20 0.50
LPAR5 Q9H1C0 2/20 0.50
KDM4E B2RXH2 1/20 0.50
HPGD P15428 1/20 0.50
CAMKK2 Q96RR4 1/20 0.49
RXRA P19793 1/20 0.49
RXRB P28702 1/20 0.49
RXRG P48443 1/20 0.49
NR4A1 P22736 1/20 0.49
NR4A2 P43354 1/20 0.49
NR4A3 Q92570 1/20 0.49
NCOA1 Q15788 1/20 0.49
NCOA3 Q9Y6Q9 1/20 0.49
CA1 P00915 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2710772 0.98 SRD5A2 (0.59) SRD5A2TTRPARP10PARP15FEN1
SCHEMBL30856503 0.91 FFAR4 (0.58) SRD5A2TTRPARP10PARP15FEN1
SCHEMBL4326298 0.91 NCOA1 (0.62) SRD5A2TTRPARP10PARP15FEN1
SCHEMBL7706043 0.90 SRD5A2 (0.68) SRD5A2TTRPARP10PARP15PKM
SCHEMBL30856488 0.90 SRD5A2 (0.59) SRD5A2TTRPARP10PARP15FEN1
Ether SCHEMBL9346095 0.89 LPAR1 (0.50) SRD5A2TTRFEN1PKMLPAR1
Hydrochloric Acid SCHEMBL8433842 0.88 SRD5A2 (0.66) SRD5A2TTRPARP10PARP15PKM
Hydrochloric Acid SCHEMBL8433836 0.88 SRD5A2 (0.66) SRD5A2TTRPARP10PARP15PKM
SCHEMBL21178076 0.88 NCOA1 (0.58) SRD5A2TTRFEN1CAMKK2RXRA
SCHEMBL27676418 0.86 RXRA (0.49) SRD5A2TTRPARP10PARP15FEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-6256259-A None JP disclosed
EP-3896114-B1 POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT SHINETSU CHEMICAL CO (JP) 2023-10-18 EP disclosed
US-11572442-B2 Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2023-02-07 US disclosed
EP-3896114-A1 NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT Shin-Etsu Chemical Co., Ltd. (JP) 2021-10-20 EP disclosed
US-20210317270-A1 NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-14 US disclosed
JP-H06256259-A AROMATIC DICARBOXYLIC ACID AND POLYAMIDE IMAI YOSHIO 1994-09-13 JP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11572442-B2 Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component BRIX1, RBX1, HAX1 SRD5A2 1930/4885TTR 4589/4885PARP10 361/4885
US-20210317270-A1 NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT BRIX1, HAX1, RBX1 SRD5A2 1974/4885TTR 4664/4885PARP10 329/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.