SCHEMBL308671

SCHEMBL308671

CC(c1ccc(Oc2ccc(N)cc2)cc1)c1ccc(Oc2ccc(N)cc2)cc1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.64
TDP1 Q9NUW8 6/20 0.64
CYP3A4 P08684 2/20 0.64
TSHR P16473 2/20 0.64
TEAD4 Q15561 1/20 0.58
MAPT P10636 5/20 0.56
POLB P06746 1/20 0.56
MAOA P21397 2/20 0.54
SMN1; SMN2 Q16637 3/20 0.54
MAOB P27338 1/20 0.52
NPC1 O15118 3/20 0.52
RAB9A P51151 3/20 0.52
MAPK1 P28482 2/20 0.52
HPGD P15428 1/20 0.52
MEN1 O00255 3/20 0.50
KMT2A Q03164 3/20 0.50
MITF O75030 1/20 0.50
GAA P10253 1/20 0.50
GFER P55789 1/20 0.50
NLRP1 Q9C000 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12112119 1.00 ALDH1A1 (0.64) ALDH1A1TDP1CYP3A4TSHRTEAD4
SCHEMBL14302875 0.89 ALDH1A1 (0.50) ALDH1A1TDP1CYP3A4TSHRTEAD4
SCHEMBL9144439 0.88 ALDH1A1 (0.67) ALDH1A1TDP1CYP3A4TSHRTEAD4
SCHEMBL1851650 0.86 ALDH1A1 (0.64) ALDH1A1TDP1CYP3A4TSHRTEAD4
SCHEMBL8095943 0.85 ESR1 (0.52) ALDH1A1TDP1CYP3A4TSHRMAPT
SCHEMBL3482829 0.85 ESR1 (0.52) ALDH1A1TDP1CYP3A4TSHRMAPT
SCHEMBL140799 0.85 ESR1 (0.52) ALDH1A1TDP1CYP3A4TSHRMAPT
SCHEMBL8164161 0.85 ESR1 (0.52) ALDH1A1TDP1CYP3A4TSHRMAPT
SCHEMBL8861766 0.83 ALDH1A1 (0.47) ALDH1A1TDP1CYP3A4TSHRTEAD4
SCHEMBL8955763 0.83 ALDH1A1 (0.58) ALDH1A1TDP1CYP3A4TSHRTEAD4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 568 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5459233-A High temperature engineering aromatic polyimides MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1995-10-17 US claimed
US-5288843-A Polymerizing 4,4'-bis(3-aminophenoxy)biphenyl, pyromellitic dianhydride and a different aromaticdiamine; engineering plastics; molding mateials; aerospace; heat resistance; melt processibility MITSUI TOATSU CHEMICALS, INC. (JP) 1994-02-22 US claimed
US-4435560-A HEAT RESISTANT, GOOD PROCESSABILITY HITACHI, LTD. (JP) 1984-03-06 US claimed
US-12479194-B2 Laminate TOYOBO CO., LTD. (JP) 2025-11-25 US disclosed
US-12472732-B2 Laminate, method for manufacturing laminate, and method for manufacturing flexible electronic device TOYOBO CO., LTD. (JP) 2025-11-18 US disclosed
US-12391813-B2 Layered body including inorganic substrate and polyamic acid cured product TOYOBO CO., LTD. (JP) 2025-08-19 US disclosed
US-20250019508-A1 LAYERED BODY INCLUDING INORGANIC SUBSTRATE AND POLYAMIC ACID CURED PRODUCT TOYOBO CO., LTD. (JP) 2025-01-16 US disclosed
US-12172409-B2 Laminate of inorganic substrate/polymer film layer with attached protective film, laminate stack, laminate storage method, and laminate transport method TOYOBO CO., LTD. (JP) 2024-12-24 US disclosed
US-20240375381-A1 TRANSPARENT HEAT-RESISTANT LAMINATED FILM TOYOBO CO., LTD. (JP) 2024-11-14 US disclosed
US-12115755-B2 Laminate of polyimide film and inorganic substrate TOYOBO CO., LTD. (JP) 2024-10-15 US disclosed
US-20240336033-A1 LAMINATE TOYOBO CO., LTD. (JP) 2024-10-10 US disclosed
EP-0294195-A2 Polyimide resin composition MITSUI TOATSU CHEMICALS, Inc. (JP) 1988-12-07 EP disclosed
US-4758875-A Resin encapsulated semiconductor device HITACHI, LTD. (JP) 1988-07-19 US disclosed
EP-0269319-A2 Polyimide MITSUI TOATSU CHEMICALS, Inc. (JP) 1988-06-01 EP disclosed
EP-0032745-B1 ETHER IMIDES AND PROCESS FOR PRODUCING THE SAME Hitachi, Ltd. (JP) 1987-01-07 EP disclosed
EP-0047530-B1 MALEIMIDE RESIN COMPOSITION AND PROCESS FOR ITS PRODUCTION Hitachi, Ltd. (JP) 1986-12-10 EP disclosed
US-4460783-A AMIDATION, CYCLIZATION, DEHYDRATION HITACHI, LTD. (JP) 1984-07-17 US disclosed
US-4435560-A HEAT RESISTANT, GOOD PROCESSABILITY HITACHI, LTD. (JP) 1984-03-06 US disclosed
EP-0047530-A2 Maleimide resin composition and process for its production Hitachi, Ltd. (JP) 1982-03-17 EP disclosed
EP-0032745-A2 Ether imides and process for producing the same Hitachi, Ltd. (JP) 1981-07-29 EP disclosed