SCHEMBL3087172

SCHEMBL3087172

CCN(CC)CC.ClB(Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Chloromethane SCHEMBL6905936 0.82
SCHEMBL30 0.82
SCHEMBL1736341 0.82 ALDH1A1 (0.40)
SCHEMBL124190 0.82
SCHEMBL7460196 0.78
Methylene Chloride SCHEMBL187626 0.78 ALDH1A1 (0.36)
Chlorolithium SCHEMBL9474737 0.78
SCHEMBL9694495 0.78
Hypochlorous Acid SCHEMBL1019174 0.78
SCHEMBL7628923 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7595351-B2 Epoxy resin, photoinitiator, liquid diacrylate, liquid poly(meth) acrylate, polyether, polyester, polyurethane, and stabilizer HUNTSMAN ADVANCED MATERIALS AMERICAS INC. (US) 2009-09-29 US claimed
CN-100351284-C Actinic radiation curable compositions and uses thereof HUNTSMAN ADV MAT SWITZERLAND (CH) 2007-11-28 CN claimed
US-20060235101-A1 Actinic radiation curable compositions and their use 3D SYSTEMS, INC. 2006-10-19 US claimed
CN-1659204-A Actinic radiation curable compositions and uses thereof HUNTSMAN ADV MAT SWITZERLAND (CH) 2005-08-24 CN claimed
EP-1509560-A1 ACTINIC RADIATION CURABLE COMPOSITIONS AND THEIR USE Huntsman Advanced Materials (Switzerland) GmbH (CH) 2005-03-02 EP claimed
WO-2003104296-A1 ACTINIC RADIATION CURABLE COMPOSITIONS AND THEIR USE VANTICO AG (CH) 2003-12-18 WO claimed
EP-1817148-B1 METHOD OF MAKING HIGH TEMPERATURE RESISTANT MODELS OR TOOLS AND COMPOSITON THEREFOR HUNTSMAN ADV MAT SWITZERLAND (CH) 2015-07-22 EP disclosed
US-8540840-B2 Method of making high temperature resistant models or tools HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) 2013-09-24 US disclosed
US-20100233380-A1 METHOD OF MAKING HIGH TEMPERATURE RESISTANT MODELS OR TOOLS HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) 2010-09-16 US disclosed
US-7708858-B2 Method of making high temperature resistant models or tools HUNTSMAN ADVANCED MATERIALS AMERICAS INC. (US) 2010-05-04 US disclosed
US-7595351-B2 Epoxy resin, photoinitiator, liquid diacrylate, liquid poly(meth) acrylate, polyether, polyester, polyurethane, and stabilizer HUNTSMAN ADVANCED MATERIALS AMERICAS INC. (US) 2009-09-29 US disclosed
US-20090062477-A1 Animal models comprising at least one conditional ko and one conditional ki GENOWAY (FR) 2009-03-05 US disclosed
US-20080099955-A1 Method Of Making High Temperature Resistant Models Or Tools CLEAVER MATTHEW 2008-05-01 US disclosed
EP-0389084-B1 Process for producing a polyborosilazane TONEN CORP (JP) 1995-09-20 EP disclosed
US-5292830-A Silane, silazane, boron block crosslinked copolymers TONEN CORPORATION (JP) 1994-03-08 US disclosed
EP-0519496-A1 Thermosetting copolymers, silicon carbide-based fiber and processes for producing same Tonen Corporation (JP) 1992-12-23 EP disclosed
US-5128286-A BORON-CONTAINING, SILICON NITRIDE-BASED CERAMIC SHAPED BODY TONEN CORPORATION (JP) 1992-07-07 US disclosed
US-5030744-A Polyborosilazane and process for producing same TONEN CORPORATION (JP) 1991-07-09 US disclosed
EP-0404503-A1 Boron-containing, silicon nitride-based ceramic shaped body production process Tonen Corporation (JP) 1990-12-27 EP disclosed
EP-0389084-A2 Process for producing a polyborosilazane Tonen Corporation (JP) 1990-09-26 EP disclosed