⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3875953 | 0.83 | — | — | |
| SCHEMBL5671464 | 0.82 | OPRM1 (0.32) | — | |
| SCHEMBL11303488 | 0.81 | OPRM1 (0.56) | — | |
| SCHEMBL9819155 | 0.80 | — | — | |
| SCHEMBL308919 | 0.80 | — | — | |
| SCHEMBL9295913 | 0.79 | OPRM1 (0.54) | — | |
| SCHEMBL1794453 | 0.79 | OPRM1 (0.54) | — | |
| SCHEMBL11300888 | 0.79 | OPRM1 (0.54) | — | |
| SCHEMBL9193047 | 0.79 | OPRM1 (0.54) | — | |
| SCHEMBL11300003 | 0.79 | OPRM1 (0.54) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 120 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107357142-B | Aqueous photoresist stripping liquid and preparation method thereof | 杭州格林达电子材料股份有限公司 | 2021-01-26 | — | — | CN | claimed |
| CN-111117223-A | Nylon material for automobile bearing and preparation method thereof | 南京聚隆科技股份有限公司 | 2020-05-08 | — | — | CN | claimed |
| US-8143408-B2 | N-(8-heteroaryltetrahydronaphtalene-2yl) or N-(5-heteroarylchromane-3-yl) carboxamide derivatives for the treatment of pain | ASTRAZENECA AB (SE) | 2012-03-27 | — | — | US | claimed |
| US-20100137322-A1 | NOVEL N-(8-HETEROARYLTETRAHYDRONAPHTALENE-2YL) OR N-(5-HETEROARYLCHROMANE-3-YL) CARBOXAMIDE DERIVATIVES FOR THE TREATMENT OF PAIN | ASTRAZENECA AB (SE) | 2010-06-03 | — | — | US | claimed |
| EP-2158198-A2 | NOVEL N- (8HETEROARYLTETRAHYDRONAPHTALENE-2YL) OR N- (5- HETEROARYLCHROMANE-3-YL) CARBOXAMIDE DERIVATIVES FOR THE TREATMENT OF PAIN | AstraZeneca AB (SE) | 2010-03-03 | — | — | EP | claimed |
| WO-2008130320-A2 | NOVEL N- (8-HETEROARYLTETRAHYDRONAPHTALENE-2YL) OR N- (5- HETEROARYLCHROMANE-3-YL) CARBOXAMIDE DERIVATIVES FOR THE TREATMENT OF PAIN | ASTRAZENECA AB (SE) | 2008-10-30 | — | — | WO | claimed |
| EP-0576445-B1 | A COMPOSITION FOR USE IN WASHING AND CLEANSING VULCANIZATION MOLDS | SAN MARTINO SPA (IT) | 1996-05-15 | — | — | EP | claimed |
| EP-0576445-A1 | A COMPOSITION FOR USE IN WASHING AND CLEANSING VULCANIZATION MOLDS. | SILVANI ANTINCENDI SPA (IT) | 1994-01-05 | — | — | EP | claimed |
| WO-1992016346-A1 | A COMPOSITION FOR USE IN WASHING AND CLEANSING VULCANIZATION MOLDS | SILVANI ANTINCENDI S.P.A (IT) | 1992-10-01 | — | — | WO | claimed |
| US-4076537-A | Light-sensitive materials containing organo tellurium or selenium compounds and sensitizers | FUJI PHOTO FILM CO., LTD. (JA) | 1978-02-28 | — | — | US | claimed |
| CN-113574041-B | Bisphenol production method and polycarbonate resin production method | 三菱化学株式会社 | 2023-10-13 | — | — | CN | disclosed |
| CN-113574041-A | Method for producing bisphenol and method for producing polycarbonate resin | 三菱化学株式会社 | 2021-10-29 | — | — | CN | disclosed |
| CN-108699694-B | Electroless plating base agent comprising highly branched polymer and metal fine particles | 日产化学株式会社 | 2021-03-12 | — | — | CN | disclosed |
| US-10920179-B2 | Cleaning solution and method for cleaning substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-02-16 | — | — | US | disclosed |
| CN-107357142-B | Aqueous photoresist stripping liquid and preparation method thereof | 杭州格林达电子材料股份有限公司 | 2021-01-26 | — | — | CN | disclosed |
| EP-0056637-A1 | 4(3H)-quinazolinone derivatives, process for production thereof and pharmaceutical compositions comprising said compounds | Ishikawa, Masayuki (JP) | 1982-07-28 | — | — | EP | disclosed |
| EP-0010256-A2 | Process for preparing symmetric 1,3-disubstituted ureas | BASF Aktiengesellschaft (DE) | 1980-04-30 | — | — | EP | disclosed |
| US-4076537-A | Light-sensitive materials containing organo tellurium or selenium compounds and sensitizers | FUJI PHOTO FILM CO., LTD. (JA) | 1978-02-28 | — | — | US | disclosed |
| US-4076530-A | Dry photographic copying method for producing Te images | FUJI PHOTO FILM CO., LTD. (JA) | 1978-02-28 | — | — | US | disclosed |
| US-4062685-A | ORGANO-TELLURIUM COMPOUND | FUJI PHOTO FILM CO., LTD. (JA) | 1977-12-13 | — | — | US | disclosed |