SCHEMBL30883296

SCHEMBL30883296

CCOC(=O)C(C#N)=Cc1ccc(O)c(OC)c1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 1.00
MAPT P10636 6/20 1.00
MEN1 O00255 2/20 1.00
KMT2A Q03164 2/20 1.00
PKM P14618 1/20 0.81
HTT P42858 1/20 0.81
DNM1 Q05193 3/20 0.61
KDM4E B2RXH2 2/20 0.60
HPGD P15428 2/20 0.60
NPSR1 Q6W5P4 1/20 0.60
RXFP1 Q9HBX9 1/20 0.60
KLK7 P49862 2/20 0.60
PDCD1 Q15116 1/20 0.59
CD274 Q9NZQ7 1/20 0.59
EGFR P00533 1/20 0.59
CRHBP P24387 1/20 0.59
CRHR2 Q13324 1/20 0.59
CSNK2A1 P68400 1/20 0.58
KLK14 Q9P0G3 1/20 0.58
KLK5 Q9Y337 1/20 0.58

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2270723 1.00 ALDH1A1 (1.00) ALDH1A1MAPTMEN1KMT2APKM
SCHEMBL22897308 1.00 ALDH1A1 (1.00) ALDH1A1MAPTMEN1KMT2APKM
SCHEMBL31648510 0.90 MAPT (0.82) ALDH1A1MAPTMEN1KMT2APKM
SCHEMBL22259791 0.90 ALDH1A1 (1.00) ALDH1A1MAPTMEN1KMT2APKM
SCHEMBL8364474 0.90 ALDH1A1 (1.00) ALDH1A1MAPTMEN1KMT2APKM
SCHEMBL20588334 0.88 ALDH1A1 (0.79) ALDH1A1MAPTMEN1KMT2APKM
SCHEMBL12866107 0.88 ALDH1A1 (0.78) ALDH1A1MAPTMEN1KMT2APKM
SCHEMBL9218618 0.87 DNM1 (0.80) ALDH1A1MAPTMEN1KMT2APKM
SCHEMBL9218611 0.87 DNM1 (0.80) ALDH1A1MAPTMEN1KMT2APKM
SCHEMBL17545166 0.87 DNM1 (0.80) ALDH1A1MAPTMEN1KMT2APKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4735958-A1 PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS Illumina, Inc. (US) 2026-05-06 EP claimed
EP-4630153-A1 ETCH-FREE PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS Illumina, Inc. (US) 2025-10-15 EP claimed
WO-2025006431-A1 PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS ILLUMINA, INC. (US) 2025-01-02 WO claimed
WO-2024123748-A1 ETCH-FREE PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS ILLUMINA, INC. (US) 2024-06-13 WO claimed
EP-4735958-A1 PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS Illumina, Inc. (US) 2026-05-06 EP disclosed
EP-4630153-A1 ETCH-FREE PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS Illumina, Inc. (US) 2025-10-15 EP disclosed
WO-2025006431-A1 PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS ILLUMINA, INC. (US) 2025-01-02 WO disclosed
EP-4464731-A1 SPLINT MADE OF DIFFERENT ELASTIC MATERIALS VOCO GmbH (DE) 2024-11-20 EP disclosed
EP-4461537-A1 ALIGNER MADE OF DIFFERENT ELASTIC MATERIALS VOCO GmbH (DE) 2024-11-13 EP disclosed
WO-2024123748-A1 ETCH-FREE PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS ILLUMINA, INC. (US) 2024-06-13 WO disclosed
EP-4369098-A1 RESIN COMPOSITION Cubicure GmbH (AT) 2024-05-15 EP disclosed