SCHEMBL3089310

SCHEMBL3089310

C=COC(C)Oc1ccccc1C1CCCCC1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRA2A P08913 6/20 0.50
ADRA2B P18089 5/20 0.50
ADRA2C P18825 5/20 0.50
PTGDR2 Q9Y5Y4 3/20 0.43
HTR1D P28221 2/20 0.42
HTR1B P28222 2/20 0.42
HTR1A P08908 3/20 0.41
USP2 O75604 1/20 0.39
CYP1A2 P05177 1/20 0.39
CYP2D6 P10635 1/20 0.39
CHRM1 P11229 1/20 0.39
CYP2C9 P11712 1/20 0.39
DRD1 P21728 1/20 0.39
TBXA2R P21731 1/20 0.39
PTGS1 P23219 1/20 0.39
SLC6A2 P23975 1/20 0.39
SLC6A4 P31645 1/20 0.39
ADRA1A P35348 1/20 0.39
OPRM1 P35372 1/20 0.39
DRD3 P35462 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28728680 0.81 ADRA2A (0.53) ADRA2AADRA2BADRA2CPTGDR2HTR1D
SCHEMBL12313576 0.80 ADRA2A (0.58) ADRA2AADRA2BADRA2CPTGDR2HTR1D
SCHEMBL4066071 0.79 ADRA2A (0.49) ADRA2AADRA2BADRA2CPTGDR2HTR1D
SCHEMBL9349556 0.78 ADRA2B (0.40) ADRA2AADRA2BADRA2CHTR1ACYP1A2
SCHEMBL516572 0.77 ADRA2A (0.56) ADRA2AADRA2BADRA2CPTGDR2HTR1D
SCHEMBL2586792 0.77 PTGDR2 (0.50) ADRA2AADRA2BADRA2CPTGDR2HTR1D
SCHEMBL677551 0.74 TSHR (0.38) KCNH2MEN1KMT2A
SCHEMBL4736528 0.71 HTR2C (0.68) ADRA2AADRA2BADRA2CPTGDR2HTR1D
SCHEMBL6695552 0.71 HTR2C (0.68) ADRA2AADRA2BADRA2CPTGDR2HTR1D
SCHEMBL17755141 0.71 ADRA2A (0.55) ADRA2AADRA2BADRA2CHTR1ASLC6A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7794916-B2 Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition FUJIFILM CORPORATION (JP) 2010-09-14 US disclosed
EP-1465010-B1 Positive resist composition FUJIFILM CORP (JP) 2009-10-21 EP disclosed
US-20080187863-A1 POSITIVE PHOTOSENSITIVE COMPOSITION, POLYMER COMPOUND USED FOR THE POSITIVE PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD OF THE POLYMER COMPOUND, AND PATTERN FORMING METHOD USING THE POSITIVE PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2008-08-07 US disclosed
EP-1925979-A1 Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition FUJIFILM Corporation (JP) 2008-05-28 EP disclosed
US-7232640-B1 Positive resist composition FUJIFILM CORPORATION (JP) 2007-06-19 US disclosed
US-20070128547-A1 POSITIVE RESIST COMPOSITION FUJI PHOTO FILM CO., LTD. 2007-06-07 US disclosed
EP-1465010-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. (JP) 2004-10-06 EP disclosed