Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 13/20 | 0.37 |
| ▸ | CA1 | P00915 | 12/20 | 0.37 |
| ▸ | CA9 | Q16790 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | RORA | P35398 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.31 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.31 |
| ▸ | PDK3 | Q15120 | 1/20 | 0.31 |
| ▸ | PDK4 | Q16654 | 1/20 | 0.31 |
| ▸ | F2 | P00734 | 1/20 | 0.31 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.31 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.31 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.31 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.30 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.30 |
| ▸ | MMP1 | P03956 | 1/20 | 0.30 |
| ▸ | MMP2 | P08253 | 1/20 | 0.30 |
| ▸ | MMP9 | P14780 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL448975 | 1.00 | CA2 (0.37) | CA2CA1CA9ALDH1A1RORA | |
| SCHEMBL114860 | 0.99 | CA1 (0.36) | CA2CA1CA9ALDH1A1RORA | |
| SCHEMBL3828157 | 0.94 | CA1 (0.38) | CA2CA1CA9ALDH1A1RORA | |
| SCHEMBL548236 | 0.88 | CA2 (0.39) | CA2CA1CA9MMP1MMP2 | |
| SCHEMBL548592 | 0.87 | CA1 (0.38) | CA2CA1CA9 | |
| SCHEMBL5405594 | 0.87 | CA1 (0.37) | CA2CA1LMNA | |
| SCHEMBL2897585 | 0.85 | CA2 (0.39) | CA2CA1CA9GAAF2 | |
| SCHEMBL4410699 | 0.85 | NPC1 (0.36) | CA2CA1LMNA | |
| SCHEMBL2895496 | 0.84 | CA2 (0.38) | CA2CA1CA9ALDH1A1GAA | |
| SCHEMBL3284975 | 0.84 | CA2 (0.40) | CA2CA1F2PRSS1PRSS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090291392-A1 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-11-26 | — | — | US | claimed |
| US-20080233514-A1 | POSITIVE PHOTORESIST COMPOSITION WITH A POLYMER INCLUDING A FLUOROSULFONAMIDE GROUP AND PROCESS FOR ITS USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-09-25 | — | — | US | claimed |
| US-7081326-B2 | Negative photoresist and method of using thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-07-25 | — | — | US | claimed |
| US-7063931-B2 | Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-06-20 | — | — | US | claimed |
| US-6653045-B2 | Negative resist containing a polysilsesquioxane polymer with pendant fused rings and sites for reaction with a crosslinking agent, an acid-sensitive glycolurils ascrosslinking agent, and a radiation sensitive generator | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-11-25 | — | — | US | claimed |
| US-6344305-B1 | AMPLIFIED SILICON-CONTAINING NEGATIVE-TONE RESIST COMPOSITION OF AQUEOUS BASE SOLUBLE SILICON-CONTAINING POLYMER HAVING PHENOLIC GROUP FOR O-ALKYLATION; ACID CATALYZABLE CROSSLINKING AGENT; ACID GENERATOR; SOLVENT; PHOTOSENSITIZER | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-02-05 | — | — | US | claimed |
| US-8846295-B2 | Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-09-30 | — | — | US | disclosed |
| US-20130288178-A1 | PHOTORESIST COMPOSITION CONTAINING A PROTECTED HYDROXYL GROUP FOR NEGATIVE DEVELOPMENT AND PATTERN FORMING METHOD USING THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-10-31 | — | — | US | disclosed |
| US-8202678-B2 | Wet developable bottom antireflective coating composition and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-06-19 | — | — | US | disclosed |
| US-8084185-B2 | Substrate planarization with imprint materials and processes | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-12-27 | — | — | US | disclosed |
| US-20100248147-A1 | PHOTORESIST COMPOSITIONS AND PROCESS FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER PHOTORESIST SYSTEMS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-09-30 | — | — | US | disclosed |
| US-7803521-B2 | Photoresist compositions and process for multiple exposures with multiple layer photoresist systems | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-09-28 | — | — | US | disclosed |
| EP-2212905-A1 | PHOTORESIST COMPOSITIONS AND PROCESS FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER PHOTORESIST SYSTEMS | International Business Machines Corporation (US) | 2010-08-04 | — | — | EP | disclosed |
| US-20080233514-A1 | POSITIVE PHOTORESIST COMPOSITION WITH A POLYMER INCLUDING A FLUOROSULFONAMIDE GROUP AND PROCESS FOR ITS USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-09-25 | — | — | US | disclosed |
| US-20070066750-A1 | Stabilization of vinyl ether materials | GLOBALFOUNDRIES INC. (KY) | 2007-03-22 | — | — | US | disclosed |
| US-20060194144-A1 | Low blur molecular resist | GLOBALFOUNDRIES U.S. INC. | 2006-08-31 | — | — | US | disclosed |
| US-7081326-B2 | Negative photoresist and method of using thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-07-25 | — | — | US | disclosed |
| US-7063931-B2 | Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-06-20 | — | — | US | disclosed |
| US-6048672-A | RELIEF IMAGES ON SUBSTRATES WITH TITANIUM NITRIDE SURFACES, HEATING, COATING, EXPOSURE AND DEVELOPMENT | SHIPLEY COMPANY, L.L.C. (US) | 2000-04-11 | — | — | US | disclosed |
| EP-0938029-A2 | Methods using photoresist compositions and articles produced therewith | Shipley Company LLC (US) | 1999-08-25 | — | — | EP | disclosed |