Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 13/20 | 0.37 |
| ▸ | CA1 | P00915 | 12/20 | 0.37 |
| ▸ | CA9 | Q16790 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | RORA | P35398 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.31 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.31 |
| ▸ | PDK3 | Q15120 | 1/20 | 0.31 |
| ▸ | PDK4 | Q16654 | 1/20 | 0.31 |
| ▸ | F2 | P00734 | 1/20 | 0.31 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.31 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.31 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.31 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.30 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.30 |
| ▸ | MMP1 | P03956 | 1/20 | 0.30 |
| ▸ | MMP2 | P08253 | 1/20 | 0.30 |
| ▸ | MMP9 | P14780 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3090902 | 1.00 | CA2 (0.37) | CA2CA1CA9ALDH1A1RORA | |
| SCHEMBL114860 | 0.99 | CA1 (0.36) | CA2CA1CA9ALDH1A1RORA | |
| SCHEMBL3828157 | 0.94 | CA1 (0.38) | CA2CA1CA9ALDH1A1RORA | |
| SCHEMBL548236 | 0.88 | CA2 (0.39) | CA2CA1CA9MMP1MMP2 | |
| SCHEMBL548592 | 0.87 | CA1 (0.38) | CA2CA1CA9 | |
| SCHEMBL5405594 | 0.87 | CA1 (0.37) | CA2CA1LMNA | |
| SCHEMBL2897585 | 0.85 | CA2 (0.39) | CA2CA1CA9GAAF2 | |
| SCHEMBL4410699 | 0.85 | NPC1 (0.36) | CA2CA1LMNA | |
| SCHEMBL2895496 | 0.84 | CA2 (0.38) | CA2CA1CA9ALDH1A1GAA | |
| SCHEMBL3284975 | 0.84 | CA2 (0.40) | CA2CA1F2PRSS1PRSS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 770 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10662274-B2 | Self-immolative polymers, articles thereof, and methods of making and using same | GEORGIA TECH RESEARCH CORPORATION (US) | 2020-05-26 | — | — | US | claimed |
| US-20180155483-A1 | SELF-IMMOLATIVE POLYMERS, ARTICLES THEREOF, AND METHODS OF MAKING AND USING SAME | GEORGIA TECH RESEARCH CORPORATION | 2018-06-07 | — | — | US | claimed |
| US-9740096-B2 | Positive-tone, chemically amplified, aqueous-developable, permanent dielectric | GEORGIA TECH RESEARCH CORPORATION (US) | 2017-08-22 | — | — | US | claimed |
| US-20150160551-A1 | POSITIVE-TONE, CHEMICALLY AMPLIFIED, AQUEOUS-DEVELOPABLE, PERMANENT DIELECTRIC | GEORGIA TECH RESEARCH CORPORATION (US) | 2015-06-11 | — | — | US | claimed |
| US-6821718-B2 | EXHIBIT HIGH RESISTANCE TO REACTIVE ION ETCHING IN EMPLOYING OXYGEN AND/OR CHLORINE | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-11-23 | — | — | US | claimed |
| US-6653045-B2 | Negative resist containing a polysilsesquioxane polymer with pendant fused rings and sites for reaction with a crosslinking agent, an acid-sensitive glycolurils ascrosslinking agent, and a radiation sensitive generator | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-11-25 | — | — | US | claimed |
| US-6344305-B1 | AMPLIFIED SILICON-CONTAINING NEGATIVE-TONE RESIST COMPOSITION OF AQUEOUS BASE SOLUBLE SILICON-CONTAINING POLYMER HAVING PHENOLIC GROUP FOR O-ALKYLATION; ACID CATALYZABLE CROSSLINKING AGENT; ACID GENERATOR; SOLVENT; PHOTOSENSITIZER | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-02-05 | — | — | US | claimed |
| US-12631962-B2 | Resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-19 | — | — | US | disclosed |
| US-12624392-B2 | Molecular array generation using photoresist | 10X GENOMICS, INC. (US) | 2026-05-12 | — | — | US | disclosed |
| US-20250362597-A1 | RESIST COMPOSITION AND RESIST FILM FORMING METHOD USING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-11-27 | — | — | US | disclosed |
| US-20250321485-A1 | RESIST AUXILIARY FILM COMPOSITION, AND PATTERN FORMING METHOD USING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-10-16 | — | — | US | disclosed |
| US-12393115-B2 | Positive working photosensitive material | MERCK PATENT GMBH (DE) | 2025-08-19 | — | — | US | disclosed |
| WO-2025128332-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-06-19 | — | — | WO | disclosed |
| US-6200728-B1 | Photoresist compositions comprising blends of photoacid generators | SHIPLEY COMPANY, L.L.C. | 2001-03-13 | — | — | US | disclosed |
| EP-1030221-A1 | Photoresist compositions comprising blends of photoacid generators | Shipley Company LLC (US) | 2000-08-23 | — | — | EP | disclosed |
| US-6048672-A | RELIEF IMAGES ON SUBSTRATES WITH TITANIUM NITRIDE SURFACES, HEATING, COATING, EXPOSURE AND DEVELOPMENT | SHIPLEY COMPANY, L.L.C. (US) | 2000-04-11 | — | — | US | disclosed |
| EP-0987600-A1 | Antireflective coating compositions | Shipley Company LLC (US) | 2000-03-22 | — | — | EP | disclosed |
| US-6037107-A | EXPOSING TO ACTIVATION RADIATION A POSITIVE WORKING PHOTORESIST COMPRISING AN ALKALI SOLUBLE RESIN SUBSTITUTED WITH AN ACID LABILE BLOCKING GROUP TO GENERATE HALOGENATED SULFONIC ACID BY PHOTOLYSIS | SHIPLEY COMPANY, L.L.C. (US) | 2000-03-14 | — | — | US | disclosed |
| EP-0939339-A1 | Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups | International Business Machines Corporation (US) | 1999-09-01 | — | — | EP | disclosed |
| EP-0938029-A2 | Methods using photoresist compositions and articles produced therewith | Shipley Company LLC (US) | 1999-08-25 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12631962-B2 | Resist composition and method for forming resist pattern | TERB1, TERF2, LSM8 | CA2 677/4885CA1 577/4885CA9 549/4885 |
| US-12624392-B2 | Molecular array generation using photoresist | POLL, LIG4, LIG3 | CA2 2965/4885CA1 3957/4885CA9 2236/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.