SCHEMBL309096

SCHEMBL309096

CCCC[B-](CCCC)(c1ccccc1)c1ccccc1

nearest known ligand 0.52

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TP53 P04637 2/20 0.42
SMN1; SMN2 Q16637 2/20 0.41
SIGMAR1 Q99720 1/20 0.41
DNM1 Q05193 2/20 0.39
TSHR P16473 1/20 0.39
PCSK9 Q8NBP7 1/20 0.39
LTA4H P09960 1/20 0.39
MEN1 O00255 1/20 0.38
MAPK1 P28482 1/20 0.38
KMT2A Q03164 1/20 0.38
EPHX2 P34913 1/20 0.38
PKM P14618 1/20 0.38
KCNH2 Q12809 2/20 0.38
PTGS2 P35354 1/20 0.38
HTT P42858 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Silver SCHEMBL9156386 0.98 TP53 (0.40) TP53SMN1; SMN2SIGMAR1DNM1TSHR
SCHEMBL9767891 0.98 TP53 (0.40) TP53SMN1; SMN2SIGMAR1DNM1TSHR
SCHEMBL3321392 0.98 TP53 (0.40) TP53SMN1; SMN2SIGMAR1DNM1TSHR
SCHEMBL8573975 0.93 SIGMAR1 (0.41) TP53SMN1; SMN2SIGMAR1DNM1TSHR
Tetramethylammonium Ion SCHEMBL8574973 0.93 DNM1 (0.44) TP53SMN1; SMN2SIGMAR1DNM1TSHR
SCHEMBL4530067 0.93 SIGMAR1 (0.44) TP53SMN1; SMN2SIGMAR1DNM1TSHR
SCHEMBL8571103 0.89 KCNH2 (0.36) TP53SMN1; SMN2SIGMAR1DNM1TSHR
Tetrylammonium SCHEMBL3616176 0.89 DNM1 (0.38) TP53SMN1; SMN2SIGMAR1DNM1TSHR
SCHEMBL8566280 0.88 DNM1 (0.41) SMN1; SMN2SIGMAR1DNM1KCNH2
Tetrabuthylammonium SCHEMBL8567159 0.88 SLC22A1 (0.46) TP53SMN1; SMN2SIGMAR1DNM1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4010441-B1 LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME MERCK PATENT GMBH (DE) 2023-09-06 EP disclosed
US-20220267532-A1 LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME MERCK PATENT GMBH (DE) 2022-08-25 US disclosed
EP-4010441-A1 LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME Merck Patent GmbH (DE) 2022-06-15 EP disclosed
CN-114207043-A Composition for producing low dielectric constant siliceous film and method for producing cured film and electronic device using the same 默克专利有限公司 2022-03-18 CN disclosed
CN-108700785-B Display element sealing agent, liquid crystal sealing agent, cured product of liquid crystal sealing agent, liquid crystal display panel, and method for producing liquid crystal display panel 三井化学株式会社 2021-05-28 CN disclosed
WO-2021028297-A1 LOW DIELECTRIC CONSTANT SILICEOUS FILM MANUFACTURING COMPOSITION AND METHODS FOR PRODUCING CURED FILM AND ELECTRONIC DEVICE USING THE SAME MERCK PATENT GMBH (DE) 2021-02-18 WO disclosed
US-8092982-B2 Photosensitive paste composition, barrier rib prepared using the composition and plasma display panel comprising the barrier rib SAMSUNG SDI CO., LTD. (KR) 2012-01-10 US disclosed
EP-2082994-A1 Photosensitive paste composition, barrier ribs prepared using the composition and plasma display panel comprising the barrier ribs Samsung SDI Co., Ltd. (KR) 2009-07-29 EP disclosed
US-20090186187-A1 PHOTOSENSITIVE PASTE COMPOSITION, BARRIER RIBS PREPARED USING THE COMPOSITION AND PLASMA DISPLAY PANEL COMPRISING THE BARRIER RIBS SAMSUNG SDI CO., LTD. (KR) 2009-07-23 US disclosed
US-20090071693-A1 NEGATIVE PHOTOSENSITIVE MATERIAL AND CIRCUIT BOARD MITSUI CHEMICALS, INC. (JP) 2009-03-19 US disclosed
US-6316089-B1 UNSATURATED POLYESTER RESIN OR VINYL ESTER RESIN (E.G., ACRYLATED EPOXY RESIN); AT LEAST TWO PHOTOPOLYMERIZATION INITIATORS HAVING PHOTOSENSITIVITY IN DIFFERENT WAVELENGTH RANGES FROM ULTRAVIOLET RANGE TO NEAR INFRARED RANGE SHOWA DENKO K.K. (JP) 2001-11-13 US disclosed
US-6211260-B1 MARKING ROADS WITH CURABLE PAINT, FILLERS, GLASS BEADS, CATIONIC DYES AND QUATERNARY ORGANIC BORATES SHOWA DENKO K.K. (JP) 2001-04-03 US disclosed
US-6207726-B1 STORAGE STABILITY; CURABILITY SHOWA DENKO KABUSHIKI KAISHA (JP) 2001-03-27 US disclosed
EP-1044777-A1 Molding method for corrosion-resistant FRP SHOWA DENKO KABUSHIKI KAISHA (JP) 2000-10-18 EP disclosed
EP-1002817-A2 Photocurable composition SHOWA DENKO KABUSHIKI KAISHA (JP) 2000-05-24 EP disclosed
EP-0922727-A1 Photocurable prepreg sheet for waterproofing Showa Denko Kabushiki Kaisha (JP) 1999-06-16 EP disclosed
EP-0915136-A1 Photocurable paint composition for road markings SHOWA DENKO KABUSHIKI KAISHA (JP) 1999-05-12 EP disclosed
EP-0353030-B1 Photopolymerization initiator and photosensitive composition employing the same CANON KK (JP) 1995-03-15 EP disclosed
US-5124235-A Photopolymerization initiator and photosensitive composition employing the same CANON KABUSHIKI KAISHA (JP) 1992-06-23 US disclosed
EP-0353030-A2 Photopolymerization initiator and photosensitive composition employing the same CANON KABUSHIKI KAISHA (JP) 1990-01-31 EP disclosed