SCHEMBL3091017

SCHEMBL3091017

C=CCCCCCCc1ccc(O)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.57
ADRA2A P08913 2/20 0.57
ADORA3 P0DMS8 2/20 0.57
TACR2 P21452 2/20 0.57
SLC6A2 P23975 2/20 0.57
SLC6A4 P31645 2/20 0.57
SLC6A3 Q01959 2/20 0.57
ALDH1A1 P00352 2/20 0.57
KDM4E B2RXH2 1/20 0.57
LMNA P02545 1/20 0.57
SHBG P04278 1/20 0.57
TP53 P04637 1/20 0.57
CYP3A4 P08684 1/20 0.57
HSPD1 P10809 1/20 0.57
ADRB3 P13945 1/20 0.57
HTR2C P28335 1/20 0.57
HSPE1 P61604 1/20 0.57
HIF1A Q16665 1/20 0.57
TST Q16762 1/20 0.57
HSD17B10 Q99714 1/20 0.57

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3113234 1.00 ESR1 (0.57) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL3095896 1.00 ESR1 (0.57) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL3112000 1.00 ESR1 (0.57) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL3100617 0.98 ESR1 (0.53) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL109815 0.92 ESR1 (0.54) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL12989712 0.89 TDP1 (0.52) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL11336193 0.89 TDP1 (0.52) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL11328438 0.87 TDP1 (0.48) ALDH1A1LMNATRPV1USP2HPGD
SCHEMBL1469766 0.84 ALDH1A1 (0.44) ESR1ADRA2AADORA3TACR2SLC6A2
SCHEMBL14562496 0.84 EP300 (0.50) ESR1ADRA2AADORA3TACR2SLC6A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2216682-B1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST ADEKA CORP (JP) 2013-07-17 EP disclosed
CN-102112922-B Positive photosensitive composition and permanent resist ADEKA CORP 2012-12-26 CN disclosed
CN-101855598-B Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist ADEKA CORP 2012-08-08 CN disclosed
US-8211619-B2 Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist ADEKA CORPORATION (JP) 2012-07-03 US disclosed
CN-102112922-A Positive photosensitive composition and permanent resist ADEKA CORP 2011-06-29 CN disclosed
US-20100273104-A1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST A D E K A (ADEKA CORPORATION) (JP) 2010-10-28 US disclosed
CN-101855598-A Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist ADEKA CORP 2010-10-06 CN disclosed
EP-2216682-A1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST Adeka Corporation (JP) 2010-08-11 EP disclosed
CN-1005270-B Preparation of low viscosity water coal slurry using sulfated O-glycoside as surfactant 普罗格特-甘布尔公司 1989-09-27 CN disclosed
CN-85108828-A Coal water slurry composition 1986-09-03 CN disclosed
EP-0186242-A1 Coal-water slurry composition THE PROCTER & GAMBLE COMPANY (US) 1986-07-02 EP disclosed
US-4597770-A SULFATED GLYCOSIDE SURFACTANT THE PROCTER & GAMBLE COMPANY (US) 1986-07-01 US disclosed
US-4472170-A O-GLYCOSIDE SURFACT<ANT DISPERSANTS THE PROCTER & GAMBLE COMPANY (US) 1984-09-18 US disclosed
EP-0113146-A1 Aqueous coal-water slurry compositions THE PROCTER & GAMBLE COMPANY (US) 1984-07-11 EP disclosed