⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17418141 | 0.77 | THRB (0.31) | — | |
| SCHEMBL340028 | 0.75 | — | — | |
| SCHEMBL29761925 | 0.74 | — | — | |
| SCHEMBL3149671 | 0.73 | — | — | |
| SCHEMBL705355 | 0.69 | — | — | |
| SCHEMBL28435247 | 0.68 | — | — | |
| SCHEMBL2045331 | 0.67 | — | — | |
| SCHEMBL30884119 | 0.67 | — | — | |
| SCHEMBL705245 | 0.67 | — | — | |
| SCHEMBL27868386 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119351032-A | Electrically detachable single-component polyurethane hot melt adhesive and preparation method and application thereof | 韦尔通科技股份有限公司 | 2025-01-24 | — | — | CN | claimed |
| US-20250188615-A1 | Gapfill Methods and Processing Assemblies | ASM IP HOLDING B.V. (NL) | 2025-06-12 | — | — | US | disclosed |
| US-12252790-B2 | Gapfill methods and processing assemblies | ASM IP HOLDING B.V. (NL) | 2025-03-18 | — | — | US | disclosed |
| US-20240117494-A1 | Gapfill methods and processing assemblies | ASM IP HOLDING B.V. (NL) | 2024-04-11 | — | — | US | disclosed |
| CN-111534149-B | High-adhesion ink and preparation method thereof | 厦门欧化实业有限公司 | 2022-06-03 | — | — | CN | disclosed |
| CN-111534149-A | High-adhesion ink and preparation method thereof | 厦门欧化实业有限公司 | 2020-08-14 | — | — | CN | disclosed |
| US-9969850-B2 | Method for producing modified polymer, and rubber composition | TOYO TIRE & RUBBER CO., LTD. (JP) | 2018-05-15 | — | — | US | disclosed |
| CN-105189565-B | Process for producing modified polymer and rubber composition | 东洋橡胶工业株式会社 | 2017-03-15 | — | — | CN | disclosed |
| US-20160009875-A1 | METHOD FOR PRODUCING MODIFIED POLYMER, AND RUBBER COMPOSITION | TOYO TIRE & RUBBER CO., LTD. (JP) | 2016-01-14 | — | — | US | disclosed |
| CN-105189565-A | Process for producing modified polymer and rubber composition | TOYO TIRE & RUBBER CO | 2015-12-23 | — | — | CN | disclosed |
| EP-2216682-B1 | POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST | ADEKA CORP (JP) | 2013-07-17 | — | — | EP | disclosed |
| US-8211619-B2 | Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist | ADEKA CORPORATION (JP) | 2012-07-03 | — | — | US | disclosed |
| US-20100273104-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST | A D E K A (ADEKA CORPORATION) (JP) | 2010-10-28 | — | — | US | disclosed |
| EP-2216682-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST | Adeka Corporation (JP) | 2010-08-11 | — | — | EP | disclosed |