SCHEMBL30985305

SCHEMBL30985305

CCCCCCc1nc(O)ccc1C(=O)O

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRP O00591 2/20 0.61
GABRD O14764 2/20 0.61
GABRA1 P14867 2/20 0.61
GABRB1 P18505 2/20 0.61
GABRG2 P18507 2/20 0.61
GABRB3 P28472 2/20 0.61
GABRA5 P31644 2/20 0.61
GABRA3 P34903 2/20 0.61
GABRA2 P47869 2/20 0.61
GABRB2 P47870 2/20 0.61
GABRA4 P48169 2/20 0.61
GABRE P78334 2/20 0.61
GABRA6 Q16445 2/20 0.61
GABRG1 Q8N1C3 2/20 0.61
GABRG3 Q99928 2/20 0.61
GABRQ Q9UN88 2/20 0.61
PPARA Q07869 3/20 0.54
KAT8 Q9H7Z6 4/20 0.50
PPARG P37231 2/20 0.47
RARB P10826 5/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11035330 0.83 GABRP (0.63) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL30985304 0.80 GABRP (0.56) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL1969600 0.76 GABRP (0.72) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL4625244 0.75 GABRP (0.50) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL135492 0.75 GABRP (0.50) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL29398777 0.75 GABRP (0.50) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL5002408 0.75 GABRP (0.50) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL9500202 0.75 GABRP (0.50) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL5002869 0.75 GABRP (0.50) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL4998460 0.75 GABRP (0.50) GABRPGABRDGABRA1GABRB1GABRG2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118401712-A Anode for electroplating and method and system for electroplating articles with metal 迪普索股份公司 2024-07-26 CN disclosed