SCHEMBL309960

SCHEMBL309960

Cc1ccc(C(O)(C(F)(F)F)C(F)(F)F)cc1C

nearest known ligand 0.52

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
NR1H2 P55055 11/20 0.52
NR1H3 Q13133 11/20 0.52
MEN1 O00255 1/20 0.52
ALOX15 P16050 1/20 0.52
TSHR P16473 1/20 0.52
MAPK1 P28482 1/20 0.52
KMT2A Q03164 1/20 0.52
HSD17B10 Q99714 1/20 0.52
MLYCD O95822 1/20 0.50
AR P10275 2/20 0.47
RORC P51449 2/20 0.46
RORA P35398 1/20 0.46
SMN1; SMN2 Q16637 2/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8586047 0.85 MEN1 (0.61) NR1H2NR1H3MEN1ALOX15TSHR
SCHEMBL10689505 0.85 MEN1 (0.47) NR1H2NR1H3MEN1ALOX15TSHR
SCHEMBL5067200 0.84 SMN1; SMN2 (0.49) NR1H2NR1H3MEN1ALOX15TSHR
SCHEMBL20919574 0.84 MEN1 (0.46) NR1H2NR1H3MEN1ALOX15TSHR
SCHEMBL24719100 0.83 MEN1 (0.58) NR1H2NR1H3MEN1ALOX15TSHR
SCHEMBL11124943 0.83 ESR1 (0.57) NR1H2NR1H3MEN1ALOX15TSHR
SCHEMBL15957656 0.81 CYP19A1 (0.43) NR1H2NR1H3MEN1KMT2AMLYCD
SCHEMBL21372573 0.81 MEN1 (0.47) NR1H2NR1H3MEN1ALOX15TSHR
SCHEMBL7101194 0.81 SMN1; SMN2 (0.55) NR1H2NR1H3MEN1ALOX15TSHR
SCHEMBL13861498 0.81 MEN1 (0.47) NR1H2NR1H3MEN1ALOX15TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11785845-B2 Composition FUJIFILM CORPORATION (JP) 2023-10-10 US disclosed
US-20220045283-A1 COMPOSITION FUJIFILM CORPORATION (JP) 2022-02-10 US disclosed
US-9939729-B2 Resist pattern-forming method JSR CORPORATION (JP) 2018-04-10 US disclosed
US-9766547-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device FUJIFILM CORPORATION (JP) 2017-09-19 US disclosed
CN-106699509-A Preparation method of 2-(3,4-xylyl)-1,1,1,3,3,3-hexafluoro-2-propanol 浙江蓝天环保高科技股份有限公司 2017-05-24 CN disclosed
CN-106699509-A Preparation method of 2-(3,4-xylyl)-1,1,1,3,3,3-hexafluoro-2-propanol 浙江蓝天环保高科技股份有限公司 2017-05-24 CN disclosed
US-20170075224-A1 RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2017-03-16 US disclosed
US-20170059992-A1 RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2017-03-02 US disclosed
US-20160041465-A1 PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-02-11 US disclosed
US-20160011517-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-01-14 US disclosed
US-7381849-B1 Synthesis of asymmetric tetracarboxylic acids and dianhydrides THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) 2008-06-03 US disclosed
US-5319131-A Reacting dimethyl 2-fluoromalonate with formaldehyde to form hydroxymethylated dimethyl 2-flurormalonate, hydrolysis, decarboxylation, dehydration then esterification with a hexafluoroalkylol HOECHST AKTIENGESELLSCHAFT (DE) 1994-06-07 US disclosed
EP-0317883-B1 PARTIALLY FLUORINATED DIPHENYL ETHERS, PROCESS FOR THEIR PREPARATION AND THEIR USE HOECHST AKTIENGESELLSCHAFT (DE) 1993-06-16 EP disclosed
US-5198925-A α-fluoroacrylic acid esters and polymers thereof HOECHST AKTIENGESELLSCHAFT 1993-03-30 US disclosed
US-5118874-A Intermediates for polycondensates HOECHST AKTIENGESELLSCHAFT (DE) 1992-06-02 US disclosed
US-4992593-A Partially fluorinated diphenyl ethers, processes for their preparation and their use HOECHST AKTIENGESELLSCHAFT (DE) 1991-02-12 US disclosed
EP-0203462-B1 ALPHA-FLUOROACRYLIC-ACID ESTERS AND THEIR POLYMERS HOECHST AKTIENGESELLSCHAFT (DE) 1990-08-01 EP disclosed
EP-0317883-A2 Partially fluorinated diphenyl ethers, process for their preparation and their use HOECHST AKTIENGESELLSCHAFT (DE) 1989-05-31 EP disclosed
EP-0203462-A2 Alpha-fluoroacrylic-acid esters and their polymers HOECHST AKTIENGESELLSCHAFT (DE) 1986-12-03 EP disclosed
US-4045408-A Fluoro-anhydride curing agents and precursors thereof for fluorinated epoxy resins THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) 1977-08-30 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220045283-A1 COMPOSITION ADH1A, ADH1C, SLC19A2 NR1H2 794/4885NR1H3 515/4885MEN1 740/4885
US-11785845-B2 Composition ADH1A, ADH1C, SLC19A2 NR1H2 794/4885NR1H3 515/4885MEN1 740/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.