⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16506925 | 1.00 | — | — | |
| SCHEMBL27138000 | 0.86 | — | — | |
| SCHEMBL1519058 | 0.81 | TSHR (0.40) | — | |
| Ethane SCHEMBL7650344 | 0.78 | TSHR (0.42) | — | |
| SCHEMBL1448934 | 0.77 | TSHR (0.36) | — | |
| SCHEMBL179976 | 0.77 | — | — | |
| SCHEMBL17186622 | 0.77 | — | — | |
| SCHEMBL239930 | 0.77 | — | — | |
| SCHEMBL408424 | 0.77 | — | — | |
| SCHEMBL319288 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20200283389-A1 | IMPROVED PROCESS FOR MAKING CROTONYLAMINOPYRIDINIES | INTERVET INC. (US) | 2020-09-10 | — | — | US | disclosed |
| US-10562834-B2 | Process for preparing substituted crotonic acids | INTERVET INC. (US) | 2020-02-18 | — | — | US | disclosed |
| EP-2831042-B1 | HETEROARYL COMPOUNDS WITH A-CYCLIC BRIDGING UNIT | INTERVET INT BV (NL) | 2019-07-31 | — | — | EP | disclosed |
| US-20190135725-A1 | PROCESS FOR PREPARING SUBSTITUTED CROTONIC ACIDS | INTERVET INC. (US) | 2019-05-09 | — | — | US | disclosed |
| EP-3394031-A1 | IMPROVED PROCESS FOR MAKING CROTONYLAMINOPYRIDINES | Intervet International B.V. (NL) | 2018-10-31 | — | — | EP | disclosed |
| WO-2017109027-A1 | IMPROVED PROCESS FOR MAKING CROTONYLAMINOPYRIDINES | INTERVET INTERNATIONAL B.V. (NL) | 2017-06-29 | — | — | WO | disclosed |
| US-20170121265-A1 | IMPROVED PROCESS FOR PREPARING SUBSTITUTED CROTONIC ACIDS | INTERVET INC. (US) | 2017-05-04 | — | — | US | disclosed |
| US-9321724-B2 | Heteroaryl compounds with A-cyclic bridging unit | INTERVET INC. (US) | 2016-04-26 | — | — | US | disclosed |
| US-9260441-B2 | Heteroaryl compounds with cyclic bridging unit | INTERVET INC. (US) | 2016-02-16 | — | — | US | disclosed |
| US-20150080365-A1 | HETEROARYL COMPOUNDS WITH CYCLIC BRIDGING UNIT | INTERVET INC. | 2015-03-19 | — | — | US | disclosed |
| US-20150057279-A1 | HETEROARYL COMPOUNDS WITH A-CYCLIC BRIDGING UNIT | INTERVET INC. | 2015-02-26 | — | — | US | disclosed |
| US-8507189-B2 | Upper layer film forming composition and method of forming photoresist pattern | JSR CORPORATION (JP) | 2013-08-13 | — | — | US | disclosed |
| US-8431332-B2 | Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern | JSR CORPORATION (JP) | 2013-04-30 | — | — | US | disclosed |
| US-20100255416-A1 | COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UPPER LAYER FILM FOR IMMERSION EXPOSURE, AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |
| US-20100040974-A1 | UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |