⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL408424 | 1.00 | — | — | |
| SCHEMBL17186622 | 1.00 | — | — | |
| Ethane SCHEMBL7650344 | 0.94 | TSHR (0.42) | — | |
| SCHEMBL5598957 | 0.80 | CYP1A2 (0.36) | — | |
| SCHEMBL899316 | 0.79 | TSHR (0.44) | — | |
| SCHEMBL27138000 | 0.79 | — | — | |
| SCHEMBL899318 | 0.79 | TSHR (0.44) | — | |
| SCHEMBL3102115 | 0.77 | — | — | |
| SCHEMBL16506925 | 0.77 | — | — | |
| SCHEMBL17275146 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1138 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3651248-B1 | CURRENT COLLECTOR FOR ELECTRICAL STORAGE DEVICE, METHOD FOR MANUFACTURING SAME, AND COATING LIQUID USED FOR MANUFACTURING SAME | SHOKO CO LTD (JP) | 2026-04-08 | — | — | EP | claimed |
| CN-119874524-A | Fluoroaryl compound, preparation method, packaging ink composition comprising fluoroaryl compound, use method and application of fluoroaryl compound | 西安思摩威新材料有限公司 | 2025-04-25 | — | — | CN | claimed |
| CN-119842405-A | Silicon wafer chemical polishing solution with high etching rate and high flatness and application thereof | 湖北兴福电子材料股份有限公司 | 2025-04-18 | — | — | CN | claimed |
| CN-119570317-A | Fluorine-containing composition with high oil resistance and water resistance and application of fluorine-containing composition in coating | 浙江华林生物科技有限公司 | 2025-03-07 | — | — | CN | claimed |
| CN-119322428-A | Preparation method of photosensitive nano-particles, photoresist solution and two-photon pattern | 甬江实验室 | 2025-01-17 | — | — | CN | claimed |
| CN-116020414-B | Carbon nano tube for adsorption separation of furfuryl amine in biocatalysis system and preparation method thereof | 中国科学院青岛生物能源与过程研究所 | 2024-11-29 | — | — | CN | claimed |
| CN-118491496-A | Solid phase extractant for extracting Artv allergen protein and homologous protein thereof, preparation method and application | 北京理工大学 | 2024-08-16 | — | — | CN | claimed |
| CN-116376420-B | Fluorine-containing coating and preparation method and application thereof | 湖南中能新材料技术有限公司 | 2024-05-24 | — | — | CN | claimed |
| WO-2024027765-A1 | METHOD FOR PREPARING URACIL COMPOUND CONTAINING CARBOXYLATE FRAGMENT | 江苏中旗科技股份有限公司 | 2024-02-08 | — | — | WO | claimed |
| EP-4294559-A1 | POROUS SORPTIVE SOLID PHASE MICROEXTRACTION DEVICES AND PREPARATION THEREOF | Memorial University of Newfoundland (CA) | 2023-12-27 | — | — | EP | claimed |
| US-20040110091-A1 | High sensitivity X-ray photoresist | MASS INSTITUTE OF TECHNOLOGY (MIT) | 2004-06-10 | — | — | US | claimed |
| EP-1044991-B1 | Process of preparing curable compositions and compositions therefrom | ROHM & HAAS (US) | 2004-02-11 | — | — | EP | claimed |
| US-20030132536-A1 | Method of making a graded index polymer optical fiber | GENERAL COMPONENTS, INC. | 2003-07-17 | — | — | US | claimed |
| WO-2003057473-A1 | GRADED INDEX POLYMER OPTICAL FIBER AND A METHOD OF MAKING THE SAME | GENERAL COMPONENTS INC. (US) | 2003-07-17 | — | — | WO | claimed |
| US-20030134119-A1 | Graded index polymer optical fiber and a method of making the same | GENERAL COMPONENTS, INC. | 2003-07-17 | — | — | US | claimed |
| US-5928832-A | Toner adsorption processes | XEROX CORPORATION (US) | 1999-07-27 | — | — | US | claimed |
| EP-0682675-B1 | MATERIAL IN THE MANUFACTURE OF POLYMERIC ARTICLES | PILKINGTON BARNES HIND INC (US) | 1998-05-20 | — | — | EP | claimed |
| EP-0798285-A2 | 3,4,4-Trifluoro-3-butenoic acid or its methyl ester | MONSANTO COMPANY (US) | 1997-10-01 | — | — | EP | claimed |
| EP-0379173-B1 | Energy beam lithography resist materials | FUJITSU LTD (JP) | 1994-06-08 | — | — | EP | claimed |
| US-5213938-A | Oxidation of toner compositions | XEROX CORPORATION (US) | 1993-05-25 | — | — | US | claimed |