SCHEMBL3107771

SCHEMBL3107771

C=CCCCCc1ccc(C(=O)O)cc1

nearest known ligand 0.59

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.58
L3MBTL1 Q9Y468 1/20 0.58
RARB P10826 6/20 0.56
MEN1 O00255 2/20 0.54
KMT2A Q03164 2/20 0.54
RARA P10276 1/20 0.54
MAPT P10636 1/20 0.54
MTOR P42345 1/20 0.54
THRA P10827 6/20 0.50
THRB P10828 6/20 0.50
PLA2G1B P04054 4/20 0.47
ATG4B Q9Y4P1 4/20 0.47
CYP1A2 P05177 1/20 0.46
TDP1 Q9NUW8 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3108533 0.98 RARB (0.57) ALDH1A1L3MBTL1RARBMEN1KMT2A
SCHEMBL3111116 0.98 RARB (0.57) ALDH1A1L3MBTL1RARBMEN1KMT2A
SCHEMBL3107799 0.98 RARB (0.57) ALDH1A1L3MBTL1RARBMEN1KMT2A
SCHEMBL3096780 0.98 RARB (0.57) ALDH1A1L3MBTL1RARBMEN1KMT2A
SCHEMBL8972989 0.98 RARB (0.57) ALDH1A1L3MBTL1RARBMEN1KMT2A
SCHEMBL3100075 0.95 ALDH1A1 (0.60) ALDH1A1L3MBTL1RARBMEN1KMT2A
SCHEMBL8611134 0.94 RARB (0.65) ALDH1A1L3MBTL1RARBMEN1KMT2A
Biphenyl SCHEMBL9304661 0.92 RARB (0.56) ALDH1A1L3MBTL1RARBMEN1KMT2A
Hydrochloric Acid SCHEMBL8612294 0.92 RARB (0.63) ALDH1A1L3MBTL1RARBMEN1KMT2A
SCHEMBL3102413 0.87 ALDH1A1 (0.54) ALDH1A1L3MBTL1RARBMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2216682-B1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST ADEKA CORP (JP) 2013-07-17 EP disclosed
CN-102112922-B Positive photosensitive composition and permanent resist ADEKA CORP 2012-12-26 CN disclosed
CN-101855598-B Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist ADEKA CORP 2012-08-08 CN disclosed
US-8211619-B2 Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist ADEKA CORPORATION (JP) 2012-07-03 US disclosed
CN-102112922-A Positive photosensitive composition and permanent resist ADEKA CORP 2011-06-29 CN disclosed
US-20100273104-A1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST A D E K A (ADEKA CORPORATION) (JP) 2010-10-28 US disclosed
CN-101855598-A Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist ADEKA CORP 2010-10-06 CN disclosed
EP-2216682-A1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST Adeka Corporation (JP) 2010-08-11 EP disclosed
EP-0545409-B1 Liquid crystals with end groups containing more than one silane group CONSORTIUM ELEKTROCHEM IND (DE) 1996-03-06 EP disclosed
EP-0466183-B1 Cyclosiloxanes with mesogenic side groups CONSORTIUM ELEKTROCHEM IND (DE) 1995-09-20 EP disclosed
US-5399290-A Liquid crystals with (polysila) alkyl wing groups CONSORTIUM FUR ELEKTROCHEMISCHE INDUSTRIE GMBH (DE) 1995-03-21 US disclosed
US-5304667-A Cyclosiloxanes containing mesogenic side groups CONSORTIUM FUR ELEKTROCHEMISCHE INDUSTRIE GMBH (DE) 1994-04-19 US disclosed
US-5221759-A CYCLOSILOXANES CONTAINING MESOGENIC SIDE GROUPS CONSORTIUM FUR ELEKTROCHEMISCHE INDUSTRIE GMBH (DE) 1993-06-22 US disclosed
EP-0545409-A1 Liquid crystals with end groups containing more than one silane group Consortium für elektrochemische Industrie GmbH (DE) 1993-06-09 EP disclosed
EP-0466183-A1 Cyclosiloxanes with mesogenic side groups Consortium für elektrochemische Industrie GmbH (DE) 1992-01-15 EP disclosed