SCHEMBL3115166

SCHEMBL3115166

C=C(CCc1ccccc1C#N)C(=O)O

nearest known ligand 0.47

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
FFAR1 O14842 5/20 0.47
FFAR4 Q5NUL3 3/20 0.39
TAS2R14 Q9NYV8 1/20 0.38
RAB9A P51151 3/20 0.37
ALDH1A1 P00352 2/20 0.37
GALR3 O60755 1/20 0.37
TSPO P30536 1/20 0.37
DRD3 P35462 1/20 0.37
SMN1; SMN2 Q16637 2/20 0.37
POLB P06746 1/20 0.37
KDM4E B2RXH2 2/20 0.36
GAA P10253 1/20 0.36
DPP4 P27487 1/20 0.36
FAP Q12884 1/20 0.36
DPP8 Q6V1X1 1/20 0.36
DPP9 Q86TI2 1/20 0.36
TSHR P16473 3/20 0.36
NPC1 O15118 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30740885 0.83 FFAR1 (0.62) FFAR1FFAR4TSPODRD3
SCHEMBL447652 0.83 FFAR1 (0.62) FFAR1FFAR4TSPODRD3
SCHEMBL2410483 0.78 FFAR1 (0.47) FFAR1FFAR4RAB9AALDH1A1GALR3
SCHEMBL6365366 0.78 ALDH1A1 (0.50) FFAR1RAB9AALDH1A1GALR3KDM4E
Phenyl Propionic Acid SCHEMBL5407020 0.77 FFAR1 (0.68) FFAR1FFAR4RAB9ASMN1; SMN2POLB
SCHEMBL7906876 0.77 FFAR1 (0.56) FFAR1FFAR4ALDH1A1TSPODRD3
SCHEMBL15732948 0.77 PTGER4 (0.55) FFAR1FFAR4DPP4
SCHEMBL1137802 0.76 AKR1B1 (0.52) RAB9ANPC1
SCHEMBL7367036 0.75 FFAR1 (0.55) FFAR1FFAR4SMN1; SMN2
SCHEMBL29065674 0.75 MAPT (0.57) RAB9ASMN1; SMN2POLBKDM4EGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100273014-A1 METAL-CLAD SUBSTRATE, AND METHOD FOR PRODUCTION THEREOF FUJIFILM CORPORATION (JP) 2010-10-28 US disclosed
US-20100272902-A1 PLATING METHOD, METHOD FOR FORMING METAL THIN FILM, AND PLATING CATALYST LIQUID FUJIFILM CORPORATION (JP) 2010-10-28 US disclosed
US-20100003533-A1 METAL-FILM-COATED MATERIAL AND PROCESS FOR PRODUCING THE SAME, METALLIC-PATTERN-BEARING MATERIAL AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR POLYMER LAYER FORMATION, NITRILE GROUP-CONTAINING POLYMER AND METHOD OF SYNTHESIZING THE SAME, COMPOSITION CONTAINING NITRILE GROUP-CONTAINING POLYMER, AND LAMINATE FUJIFILM CORPORATION (JP) 2010-01-07 US disclosed
US-20090155553-A1 Method of manufacturing surface metal film material, surface metal film material, method of manufacturing patterned metal material, patterned metal material, and polymer layer-forming composition FUJIFILM CORPORATION (JP) 2009-06-18 US disclosed