Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOB | P27338 | 1/20 | 0.68 |
| ▸ | KDM4A | O75164 | 1/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.55 |
| ▸ | TSHR | P16473 | 1/20 | 0.55 |
| ▸ | HTT | P42858 | 1/20 | 0.54 |
| ▸ | NPC1 | O15118 | 5/20 | 0.53 |
| ▸ | RAB9A | P51151 | 5/20 | 0.53 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.53 |
| ▸ | MAPT | P10636 | 1/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.50 |
| ▸ | HPGD | P15428 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 1/20 | 0.50 |
| ▸ | ATM | Q13315 | 1/20 | 0.50 |
| ▸ | CA12 | O43570 | 2/20 | 0.49 |
| ▸ | CA9 | Q16790 | 2/20 | 0.49 |
| ▸ | RECQL | P46063 | 1/20 | 0.49 |
| ▸ | PTGES | O14684 | 1/20 | 0.48 |
| ▸ | SYK | P43405 | 1/20 | 0.47 |
| ▸ | HTR1A | P08908 | 1/20 | 0.47 |
| ▸ | ADRA1D | P25100 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9489214 | 0.88 | MAOB (0.72) | MAOBKDM4AALDH1A1TSHRHTT | |
| SCHEMBL920836 | 0.87 | MAOB (0.62) | MAOBKDM4AALDH1A1TSHRHTT | |
| SCHEMBL7897679 | 0.87 | MAOB (0.62) | MAOBKDM4AALDH1A1TSHRHTT | |
| SCHEMBL28376698 | 0.87 | MAOB (0.66) | MAOBKDM4AALDH1A1TSHRHTT | |
| SCHEMBL17368204 | 0.87 | MAOB (0.70) | MAOBKDM4AALDH1A1TSHRHTT | |
| SCHEMBL6542046 | 0.87 | MAOB (0.70) | MAOBKDM4AALDH1A1TSHRHTT | |
| SCHEMBL17554427 | 0.84 | MAOB (0.63) | MAOBKDM4AALDH1A1TSHRHTT | |
| SCHEMBL29568730 | 0.84 | NPC1 (0.59) | MAOBALDH1A1TSHRHTTNPC1 | |
| SCHEMBL18919738 | 0.84 | NPC1 (0.59) | MAOBALDH1A1TSHRHTTNPC1 | |
| SCHEMBL3497230 | 0.84 | MAOB (0.66) | MAOBKDM4ANPC1RAB9ASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105037197-A | Di(4-trifluoromethylbenzyl) azodiformate, intermediate and preparation method of di(4-trifluoromethylbenzyl) azodiformate | UNIV ZHEJIANG | 2015-11-11 | — | — | CN | disclosed |
| EP-1865379-B1 | Method for resist pattern formation, and process for device prodution | CANON KK (JP) | 2013-01-16 | — | — | EP | disclosed |
| CN-101086618-B | Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for elements production | CANON KK | 2012-06-20 | — | — | CN | disclosed |
| US-7651834-B2 | Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device production | CANON KABUSHIKI KAISHA (JP) | 2010-01-26 | — | — | US | disclosed |
| US-7651834-B2 | Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device production | CANON KABUSHIKI KAISHA (JP) | 2010-01-26 | — | — | US | disclosed |
| US-20070287105-A1 | PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, METHOD FOR RESIST PATTERN FORMATION, AND PROCESS FOR DEVICE PRODUCTION | CANON KABUSHIKI KAISHA (JP) | 2007-12-13 | — | — | US | disclosed |
| US-20070287105-A1 | PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, METHOD FOR RESIST PATTERN FORMATION, AND PROCESS FOR DEVICE PRODUCTION | CANON KABUSHIKI KAISHA (JP) | 2007-12-13 | — | — | US | disclosed |
| EP-1865379-A1 | Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device prodution | Canon Kabushiki Kaisha (JP) | 2007-12-12 | — | — | EP | disclosed |
| CN-101086618-A | Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for elements production | CANON KK (JP) | 2007-12-12 | — | — | CN | disclosed |
| EP-0141389-A2 | Process for the production of image-wise structured resists, and dry resist therefor | BASF Aktiengesellschaft (DE) | 1985-05-15 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070287105-A1 | PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, METHOD FOR RESIST PATTERN FORMATION, AND PROCESS FOR DEVICE PRODUCTION | RER1, C1R, CRY2 | MAOB 1351/4885KDM4A 1236/4885ALDH1A1 2569/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.