SCHEMBL3134586

SCHEMBL3134586

CCCCSC(S)C(=O)O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.41
CA2 P00918 1/20 0.39
MAPK1 P28482 1/20 0.39
GPR84 Q9NQS5 4/20 0.38
RNPEP Q9H4A4 1/20 0.38
FFAR1 O14842 1/20 0.38
MAPT P10636 3/20 0.36
PPARD Q03181 2/20 0.36
GMNN O75496 1/20 0.36
TP53 P04637 1/20 0.36
POLB P06746 1/20 0.36
THRB P10828 1/20 0.36
CYP2C9 P11712 1/20 0.36
BLM P54132 1/20 0.36
HSD17B10 Q99714 1/20 0.36
LCK P06239 1/20 0.36
ZDHHC20 Q5W0Z9 1/20 0.36
ZDHHC2 Q9UIJ5 1/20 0.36
CHRM1 P11229 1/20 0.34
AKR1A1 P14550 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10489385 0.92 EPHX1 (0.52) EPHX1GPR84FFAR1MAPTPPARD
SCHEMBL3151822 0.86
SCHEMBL4949374 0.77 EPHX1 (0.48) EPHX1CA2MAPK1GPR84FFAR1
SCHEMBL5165394 0.77 EPHX1 (0.44) EPHX1CA2MAPK1GPR84FFAR1
SCHEMBL160261 0.76 GPR84 (0.43) EPHX1CA2MAPK1GPR84FFAR1
SCHEMBL2474049 0.76 EPHX1 (0.57) EPHX1CA2MAPK1GPR84FFAR1
SCHEMBL28530777 0.75 EPHX1 (0.43) EPHX1CA2MAPK1GPR84RNPEP
SCHEMBL28364242 0.75
SCHEMBL4955447 0.74 EPHX1 (0.46) EPHX1CA2MAPK1GPR84FFAR1
SCHEMBL6237122 0.74 CA2 (0.43) EPHX1CA2MAPK1GPR84FFAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8357483-B2 Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin LG CHEM, LTD. (KR) 2013-01-22 US claimed
US-20100081089-A1 PHOTOSENSITIVE RESIN COMPOSITION COMPRISING A POLYMER PREPARED BY USING MACROMONOMER AS ALKALI SOLUBLE RESIN LG CHEM, LTD. (KR) 2010-04-01 US claimed
WO-2008127036-A2 PHOTOSENSITIVE RESIN COMPOSITION COMPRISING A POLYMER PREPARED BY USING MACROMONOMER AS ALKALI SOLUBLE RESIN LG CHEM, LTD. (KR) 2008-10-23 WO claimed
US-8357483-B2 Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin LG CHEM, LTD. (KR) 2013-01-22 US disclosed
US-20100081089-A1 PHOTOSENSITIVE RESIN COMPOSITION COMPRISING A POLYMER PREPARED BY USING MACROMONOMER AS ALKALI SOLUBLE RESIN LG CHEM, LTD. (KR) 2010-04-01 US disclosed
WO-2008127036-A2 PHOTOSENSITIVE RESIN COMPOSITION COMPRISING A POLYMER PREPARED BY USING MACROMONOMER AS ALKALI SOLUBLE RESIN LG CHEM, LTD. (KR) 2008-10-23 WO disclosed