SCHEMBL31354841

SCHEMBL31354841

Clc1ccc(C23CC4CC(CC(Br)(C4)C2)C3)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.59
MEN1 O00255 3/20 0.59
KMT2A Q03164 3/20 0.59
HTT P42858 1/20 0.59
SMN1; SMN2 Q16637 1/20 0.59
ALDH1A1 P00352 3/20 0.45
SPHK2 Q9NRA0 4/20 0.44
RAD52 P43351 1/20 0.44
GRIN2D O15399 1/20 0.44
GRIN3B O60391 1/20 0.44
GRIN1 Q05586 1/20 0.44
GRIN2A Q12879 1/20 0.44
GRIN2B Q13224 1/20 0.44
GRIN2C Q14957 1/20 0.44
GRIN3A Q8TCU5 1/20 0.44
SPHK1 Q9NYA1 2/20 0.43
PGR P06401 1/20 0.42
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
MAOA P21397 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2764154 0.91 ALDH1A1 (0.51) LMNAMEN1KMT2AHTTSMN1; SMN2
SCHEMBL4380237 0.82 GRIN2D (0.64) LMNAMEN1KMT2AHTTSMN1; SMN2
SCHEMBL21838776 0.79 LMNA (0.59) LMNAMEN1KMT2AHTTSMN1; SMN2
SCHEMBL18705090 0.79 LMNA (0.63) LMNAMEN1KMT2AHTTSMN1; SMN2
SCHEMBL132328 0.76 SPHK2 (0.59) LMNAMEN1KMT2AHTTSMN1; SMN2
SCHEMBL133608 0.74 SPHK2 (0.58) LMNAMEN1KMT2AHTTSMN1; SMN2
SCHEMBL2763348 0.74 ALDH1A1 (0.41) LMNAMEN1KMT2AHTTSMN1; SMN2
SCHEMBL2841371 0.74 LMNA (0.57) LMNAMEN1KMT2AHTTSMN1; SMN2
SCHEMBL19089824 0.74 LMNA (0.57) LMNAMEN1KMT2AHTTSMN1; SMN2
SCHEMBL1548989 0.73 LMNA (0.56) LMNAMEN1KMT2AHTTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025028487-A1 MATERIAL FOR METAL PATTERNING, HETEROCYCLIC COMPOUND, THIN FILM FOR METAL PATTERNING, ORGANIC ELECTROLUMINESCENT ELEMENT, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2025-02-06 WO disclosed