SCHEMBL3135852

SCHEMBL3135852

CC(C)(C)c1ccc([S+](c2ccccc2)c2ccccc2)cc1.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.37

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 6/20 0.37
CA1 P00915 4/20 0.36
CA2 P00918 4/20 0.36
ALDH1A1 P00352 4/20 0.34
RORA P35398 1/20 0.33
HSD17B3 P37058 1/20 0.32
UQCRB P14927 1/20 0.32
HSD17B2 P37059 1/20 0.32
NPC1 O15118 1/20 0.32
RECQL P46063 1/20 0.32
RAB9A P51151 1/20 0.32
LMNA P02545 1/20 0.32
GAA P10253 1/20 0.32
MAOA P21397 1/20 0.32
NR1H2 P55055 1/20 0.32
KDM4E B2RXH2 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3137398 1.00 HSD11B1 (0.37) HSD11B1CA1CA2ALDH1A1RORA
SCHEMBL3135784 1.00 HSD11B1 (0.37) HSD11B1CA1CA2ALDH1A1RORA
SCHEMBL384930 1.00 HSD11B1 (0.37) HSD11B1CA1CA2ALDH1A1RORA
SCHEMBL3139767 0.99 HSD11B1 (0.38) HSD11B1CA1CA2ALDH1A1RORA
SCHEMBL384049 0.99 HSD11B1 (0.38) HSD11B1CA1CA2ALDH1A1RORA
SCHEMBL678361 0.95 ALDH1A1 (0.38) HSD11B1CA1CA2ALDH1A1RORA
SCHEMBL2438820 0.95 HSD11B1 (0.38) HSD11B1CA1CA2ALDH1A1RORA
SCHEMBL51945 0.93 ALDH1A1 (0.39) HSD11B1CA1CA2ALDH1A1RORA
SCHEMBL2435494 0.92 HSD11B1 (0.38) HSD11B1CA1CA2ALDH1A1RORA
SCHEMBL3126285 0.89 HSD11B1 (0.35) HSD11B1CA1CA2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1676835-B1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT WAKO PURE CHEM IND LTD (JP) 2014-12-10 EP disclosed
US-7642368-B2 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-05 US disclosed
EP-1676835-A1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT Wako Pure Chemical Industries, Ltd. (JP) 2006-07-05 EP disclosed